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Specific Process Knowledge/Characterization/Optical characterization: Difference between revisions

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*No mapping facility
*No mapping facility
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Accessories
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Accessories
|style="background:LightGrey; color:black"|Focusing optics
|style="background:LightGrey; color:black"|Focusing optics
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*Base for ex-situ measurements, transmission data can be done by holding the sample up against the detector
*Base for ex-situ measurements, transmission data can be done by holding the sample up against the detector
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|style="background:LightGrey; color:black"|Heating stage
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*Heating stage for measurements at temperatures up to 300C
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*None
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*None
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates
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==Filmtek 4000==
==Filmtek 4000==
{{CC-bghe2}}
{{CC-bghe2}}
[[image:Filmtek.JPG|275x275px|right|thumb|FilmTek 4000: positioned in cleanroom A-1, {{photo1}}]]
[[image:Filmtek.JPG|275x275px|right|thumb|FilmTek 4000: positioned in cleanroom D-1, {{photo1}}]]
FilmTek 4000 is a computerized film thickness measurement and material characterization system. This system combines fiber-optic spectrophotometry with advanced material modeling software to provide an affordable and reliable tool for the simultaneous measurement of film thickness, index of refraction, and extinction coefficient
FilmTek 4000 is a computerized film thickness measurement and material characterization system. This system combines fiber-optic spectrophotometry with advanced material modeling software to provide an affordable and reliable tool for the simultaneous measurement of film thickness, index of refraction, and extinction coefficient