Specific Process Knowledge/Lithography/Coaters/RCD8: Difference between revisions
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===[[Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing|Process information]]=== | ===[[Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing|Process information]]=== | ||
*[[Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing#Spin coating|Spin coating]] | *[[Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing#Spin coating|Spin coating]] | ||
*[[Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing# | *[[Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing#Dispense|Dispense]] | ||
*[[Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing#Recipes|Recipes and templates]] | *[[Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing#Recipes|Recipes and templates]] | ||
*[[Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing#Processing_results|Processing results]] | *[[Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing#Processing_results|Processing results]] | ||
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|style="background:LightGrey; color:black"|Coating thickness | |style="background:LightGrey; color:black"|Coating thickness | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* SU-8 | * SU-8 resists: 0.1-200+ µm | ||
* AZ 5214E: 1.5-3 µm | * AZ 5214E: 1.5-3 µm | ||
* AZ 4562: 8-15 µm | * AZ 4562: 8-15 µm | ||