Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
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= | = 2D alignment option = | ||
In addition to alignment by beam scanning the JEOL 9500 system also has a 2D alignment feature. The working principle of this is that the system will take a SEM image of a specified location and compare the SEM image to a reference image. By comparison of these the system will determine an offset and use this for alignment. | In addition to alignment by beam scanning the JEOL 9500 system also has a 2D alignment feature. The working principle of this is that the system will take a SEM image of a specified location and compare the SEM image to a reference image. By comparison of these the system will determine an offset and use this for alignment. | ||
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Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system. | Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system. | ||
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