Specific Process Knowledge/Thin film deposition/Antistiction Coating: Difference between revisions
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These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces. | These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces. | ||
A picture showing some of chemicals MVD and the surface reaction can be found in [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=12&name=MVD+reaction.jpg | A picture showing some of chemicals MVD and the surface reaction can be found in LabManager [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=12&name=MVD+reaction.jpg here] (requires login). | ||
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