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<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>
=Dry Oxidation in the C1 furnace=
=Dry Oxidation in the C1 furnace=
The C1 furnace can be used for dry oxidation of 4" and 6" wafers.  
The C1 furnace can be used for dry oxidation of 4" and 6" wafers.  
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''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech).''
''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech), 2018.''




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