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= Tencor P17 (Stylus Profiler) =
= Tencor P17 (Stylus Profiler) =
[[image:KLA-Tencor P17 profiler.jpg|275x275px|right|thumb|Front of the P17 profiler located in cleanroom F-2.]]
The P17 Stylus Profiler from KLA Tencor is used in a similar manner to the [[Specific Process Knowledge/Characterization/Dektak XTA|Dektak XTA]] profiling surfaces with structures in the micro- and submicrometer range as well as for measuring [[Specific_Process_Knowledge/Characterization/Stress_measurement|stress]]. Both of these tools are inside the cleanroom.
The P17 Stylus Profiler from KLA Tencor is used in a similar manner to the [[Specific Process Knowledge/Characterization/Dektak XTA|Dektak XTA]] profiling surfaces with structures in the micro- and submicrometer range as well as for measuring [[Specific_Process_Knowledge/Characterization/Stress_measurement|stress]]. Both of these tools are inside the cleanroom.


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== Process information ==
== Process information ==
*Info about [[Specific Process Knowledge/Characterization/Dektak XTA#Measurement Accuracy |measurement accuracy]] (''measured with Dektak XTA'')
*Info about [[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|measurement accuracy]]
*Vendor's description of [https://labmanager.dtu.dk/view_binary.php?fileId=6385 instrument specs including reproducibility and flatness of scans] (''requires login as it seems not freely available from vendor's website'')
*Using the analysis software: [[Specific Process Knowledge/Characterization/Tencor P17#Apex Software for Data Analysis|Apex software access & tips]]
*Using the analysis software: [[Specific Process Knowledge/Characterization/Tencor P17#Apex Software for Data Analysis|Apex software access & tips]]
*Info about making [https://labmanager.dtu.dk/view_binary.php?fileId=4699 2D stress measurements] ''(requires login)''
*[https://www.kla.com/wp-content/uploads/KLA_AppNote_Stylus_2D_Stress.pdf Vendor's document on 2D stress measurements (also somewhat informative for 3D stress measurements)] including info on the automatic fitting to calculate the local radius of the wafer.
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*Tips on making [https://labmanager.dtu.dk/view_binary.php?fileId=5543 2D stress measurements] ''(requires login)''Most users will make 3D stress measurement as described in the regular Nanolab manual for the P17 in LabManager. It counts as "3D" if you wish to make 2 perpendicular scans. A "2D" stress scan means a single line scan - the software does not allow rotation of the stage for this type of scan.
Most users will want to make 3D stress measurements, which is described in the regular Nanolab manual for the P17, also found on LabManager. It counts as "3D" if you wish to make 2 perpendicular scans. A "2D" stress scan means a single line scan per wafer - the software does not even allow manual rotation of the stage for this type of scan.
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===Performance and Process Parameters===
===Performance and Process Parameters===
[[image:KLA-Tencor P17 profiler.jpg|275x275px|right|thumb|Front of the P17 profiler located in cleanroom F-2.]]


{| border="2" cellspacing="0" cellpadding="10"  
{| border="2" cellspacing="0" cellpadding="10"  
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|style="background:LightGrey; color:black"|Scan range X Y
|style="background:LightGrey; color:black"|Scan range X Y
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Line scan X: 20 µm to 200 mm in a single scan. No stitching.
*Line scan: 20 µm to 200 mm (no stitching)
 
*Map scan: Any rectangle inscribed in a 200 mm circle
Map scan XY: In principle any rectangle that can be inscribed in a 200 mm circle, but resolution is limited to max. 4 million points and scanning is slow. In practice to get good resolution scan a very small area (e.g., 100 x 500 µm)
*Map resolution max. 4 million points and scanning is slow. To get good resolution scan a small area (e.g., 200 x 500 µm)
|-
|-
|style="background:LightGrey; color:black"|Scan range Z
|style="background:LightGrey; color:black"|Scan range Z
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
50 nm to 900 µm. It is possible to measure smaller steps but not recommended as the results may not be accurate.
100 nm to 900 µm. (smaller measurements possible but inaccurate)
|-
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|style="background:LightGrey; color:black"|Resolution X Y
|style="background:LightGrey; color:black"|Resolution X Y
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Down to 0.025 µm in theory, but the tip radius is 2 µm, so the meaningful resolution is at the same order of magnitude
*0.025 µm in theory
*limited by tip shape and size
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|style="background:LightGrey; color:black"|Resolution Z
|style="background:LightGrey; color:black"|Resolution Z
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
0.01 Å, 0.08 Å, or 0.6 Å according to the manufacturer for ranges 13 µm, 131 µm, and 1 mm. Note the smallest of these values are purely theoretical as they are far below the lab's noise level.
0.01 Å, 0.08 Å, or 0.6 Å for ranges 13 µm, 131 µm, and 1 mm.  
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|-
|style="background:LightGrey; color:black"|Height accuracy z (95 % confidence)
|style="background:LightGrey; color:black"|Height accuracy z (95 % confidence)
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
~ 2 % for the smallest range for a 1 micron step and ~ 1 % for a 25 micron step '''for well-defined steps that are easy to measure''' (read about reducing and estimating the measurement uncertainty [[Specific Process Knowledge/Characterization/Dektak XTA#Measurement Accuracy |here]])
*~ 2 % for a 1 µm step with the 13 µm range
*~ 1 % for a 25 µm step  
*'''for well-defined steps that are easy to measure'''  
*[[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|More info here]])
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|-
|style="background:LightGrey; color:black"|Max scan depth as a function of trench width W
|style="background:LightGrey; color:black"|Max scan depth as a function of trench width W
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*2 µm 60<sup>o</sup> cone
*2 µm 60<sup>o</sup> cone
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!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates
!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates and film materials
|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Up to 8"
*Up to 8"
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| style="background:LightGrey; color:black"|Substrate materials allowed
| style="background:LightGrey; color:black"|Materials allowed
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*All materials that do not stick to the tip or leave residues on the chuck.
*All materials that do not stick to the tip or leave residues on the chuck.
*For very soft materials we recommend the Dektak150, see below.
*For very soft materials we recommend the [[Specific Process Knowledge/Characterization/Topographic measurement#Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab| Dektak 150]].
|-  
|-  
|}
|}
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== Apex Software for Data Analysis ==
== Apex Software for Data Analysis ==
The Tencor-KLA P17 stylus profiler comes with advanced data analysis software called APEX. We have an extra license for the software on a computer in the basement of building 346. The computer is located at the back of room 904 between the XRD Powder and the AFM. At the moment remote access is not possible, but you are able to access your files on the M-drive from the computer. Let us know if you would like us to find a solution for remote access and/or would like us to move the analysis computer to a room with daylight, as we are not sure how many of you would actually like to use the software.
The Tencor-KLA P17 stylus profiler comes with advanced data analysis software called APEX. We have an extra license for the software on a computer in the basement of building 346. The computer is located at the back of room 904 between the XRD Powder and the AFM. At the moment remote access is not possible, but you are able to access your files on the M-drive from the computer. Let us know if you would like us to find a solution for remote access and/or would like us to move the analysis computer to a room with daylight, as we are not sure how many of you would actually like to use the software.
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[[image:pick-points-drawing.png|500x500px|right|thumb|How to choose to show only the measured line scans rather than the interpolated surface that APEX likes to calculate (see orange arrow). Screenshot by reet, DTU Nanolab, from Apex.]]
[[image:pick-points-drawing.png|500x500px|right|thumb|How to choose to show only the measured line scans rather than the interpolated surface that APEX likes to calculate (see orange arrow). Screenshot by reet, DTU Nanolab, from Apex.]]


There are a number of tutorials and a thorough help document which you will find when you open the program. There is also a small introduction as an appendix to the [https://labmanager.dtu.dk/view_binary.php?fileId=4699 P17 help document] ''(requires login)''.
There are a number of tutorials and a help document which you will find when you open the program. There is also a small introduction as an appendix to the [https://labmanager.dtu.dk/view_binary.php?fileId=4699 P17 help document] ''(requires login)''.


Apex offers many formats for saving the data in nice reports and various options for exporting data.
Apex offers many formats for saving the data in nice reports and various options for exporting data.