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Specific Process Knowledge/Thin film deposition/Deposition of Gold: Difference between revisions

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|-style="background:WhiteSmoke; color:black"
! Layer thickness
! Layer thickness
|10 Å to 1 µm *
|10 Å to 600 nm *
|10 Å to 200 nm  
|10 Å to 200 nm  
|10 Å to 500 nm **
|10 Å to 500 nm *
|10 Å to 500 nm **
|10 Å to 500 nm *
| very thin, few nm range
| very thin, few nm range
| very thin, few nm range
| very thin, few nm range
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|-style="background:LightGrey; color:black"
! Deposition rate
! Deposition rate
|0.5-5 Å/s
|1-5 Å/s
|1 Å/s (can be adjusted to around 5 Å/s)
|1 Å/s (can be adjusted to around 5 Å/s)
|Depends on process parameters, 1-10 Å/s  
|Depends on process parameters, 1-10 Å/s  
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|-style="background:LightGrey; color:black"
!Heating
|to 250 C (in 10-pocket evaporator)
|no
|no
|to 600 C
|no
|no
|-style="background:WhiteSmoke; color:black"
!Allowed materials
!Allowed materials


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* All samples allowed in the SEM Supra 2 or 3
* All samples allowed in the SEM Supra 2 or 3


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|-style="background:LightGrey; color:black"
! Comment
! Comment
|
|
* For thicknesses above 600 nm permission is required
* Pumpdown approx 20 min.
* Pumpdown approx 20 min.
|
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'''*'''  ''For thicknesses above 600 nm write to metal@nanolab.dtu.dk to ensure that there will be enough material in the machine.''
'''*'''  ''For thicknesses above 200 nm write to metal@nanolab.dtu.dk as extra deposition costs a higher fee.''
 
'''**'''  ''For thicknesses above 200 nm write to metal@nanolab.dtu.dk to ensure that there will be enough material in the machine.''


== Resistive thermal evaporation of Au ==
== Resistive thermal evaporation of Au ==
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*[http://labmanager.dtu.dk/d4Show.php?id=5862&mach=429 QC procedure for the E-beam Evaporator (Temescal)]<br>
TiAu or CrAu is tested approximately once a month on both of Nanolab's e-beam evaporators.
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=429 The newest QC data for the E-beam Evaporator (Temescal)]<br>
 
'''You can find the QC procedures and data in LabManager here''' (requires login):
 
*[http://labmanager.dtu.dk/d4Show.php?id=5862&mach=429 QC procedure, E-beam Evaporator (Temescal)]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=429 Newest QC data, E-beam Evaporator (Temescal)]<br>
 
*[http://labmanager.dtu.dk/d4Show.php?id=5862&mach=511 QC procedure, E-beam Evaporator (10-pockets)]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=511 Newest QC data, E-beam Evaporator (10-pockets)]<br>
 


*[http://labmanager.dtu.dk/d4Show.php?id=5862&mach=511 QC procedure for the E-beam Evaporator (10-pockets)]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=511 The newest QC data for the E-beam Evaporator (10-pockets)]<br>


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! QC Recipe:
! QC Recipe:
! Standard recipes/TiAu or Cr/Au
! Standard recipes/TiAu or Cr/Au
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!QC limits
!QC limits
!Both e-beam evaporators
!Both e-beam evaporators
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Thickness is measured in 5 points with a stylus profiler. <br>
Thickness is measured in 5 points with a stylus profiler. <br>
Additionally we examine the newly deposited films for particles using the particle scanner (if available, otherwise we use the Jenatech microscope in darkfield mode) and we monitor the sheet resistance of the Ti/Au or Cr/Au films.
Additionally we examine the newly deposited films for particles using the particle scanner (if available, otherwise we use the Jenatech microscope in darkfield mode) and we monitor the sheet resistance of the Ti/Au or Cr/Au films.
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