Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Silver: Difference between revisions

Reet (talk | contribs)
Reet (talk | contribs)
 
(One intermediate revision by the same user not shown)
Line 65: Line 65:
|
|
*Up to 4x6" wafers or
*Up to 4x6" wafers or
*Up to 3x8" wafers *** or
*Up to 3x8" wafers
or
*smaller pieces
*smaller pieces
|
|
Line 85: Line 86:
*Almost any as long as it does not outgas if you plan to use substrate heating. See cross-contamination sheets in Labmanager.
*Almost any as long as it does not outgas if you plan to use substrate heating. See cross-contamination sheets in Labmanager.
|
|
*Almost any as long as it does not outgas. See cross-contamination sheets in Labmanager.
*Almost any as long as it does not outgas. See cross-contamination sheet in Labmanager.
|
|
*Almost any as long as it does not outgas. See cross-contamination sheets in Labmanager.
* Almost any that do not degas. See also the [https://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=244 cross-contamination sheet]
|
|
*Almost any as long as it does not outgas if you plan to use substrate heating. See cross-contamination sheets in Labmanager.
*Almost any that does not degas at your intended substrate temperature. See cross contamination sheets for [https://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=441 PC1] and [https://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=442 PC3]
|-style="background:whitesmoke; color:black"
|-style="background:whitesmoke; color:black"
! Comment
! Comment
Line 102: Line 103:


'''**'''  ''For thicknesses above 200 nm please get permission from ThinFilm group by writing to metal@nanolab.dtu.dk''
'''**'''  ''For thicknesses above 200 nm please get permission from ThinFilm group by writing to metal@nanolab.dtu.dk''
'''***'''  ''Please ask responsible staff for 8" wafer holder''