Jump to content

Specific Process Knowledge/Thin film deposition/thermalevaporator: Difference between revisions

← Older edit
VisualWikitext
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
No edit summary
 
(5 intermediate revisions by the same user not shown)
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/thermalevaporator click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/thermalevaporator click here]'''  


<i> This page is written by <b>DTU Nanolab staff</b></i>
<i> This page is written by <b>DTU Nanolab staff</b></i>
Line 30: Line 30:


*[[Specific Process Knowledge/Thin film deposition/Deposition of Aluminium/Thermal deposition of Al|Aluminium]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Aluminium/Thermal deposition of Al|Aluminium]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silver|Silver]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silver/Deposition of Silver in Thermal Evaporator|Silver]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Thermal evaporation of Cr in Thermal evaporator|Chromium]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Thermal evaporation of Cr in Thermal evaporator|Chromium]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Germanium/Thermal Ge evaporation Thermal Evaporator|Germanium]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Germanium/Thermal Ge evaporation Thermal Evaporator|Germanium]]
Line 49: Line 49:
!style="background:silver; color:black" align="left" valign="top" rowspan="5"|Performance
!style="background:silver; color:black" align="left" valign="top" rowspan="5"|Performance
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"|
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"|
*10Å - 1µm (Al and Ag)
*10Å - 1µm (Al)
*up to 100 nm (Cr) (ask if you wish to deposit more)
*10Å - 0.5µm (Ag)
*for other metals ask if in doubt
*up to 100 nm (Cr)
*ask the [mailto:thinfilm@nanolab.dtu.dk Thin Film group] if in doubt or if you wish to exceed the limits
|-
|-
|style="background:LightGrey; color:black"|Deposition rate
|style="background:LightGrey; color:black"|Deposition rate
Line 89: Line 90:
|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Up to 8" wafer
*Up to 1 x 6 " or 8" wafer
*Or several smaller pieces
*Up to 3 x 4" wafers
*Many smaller pieces
*Deposition on one side of the substrate
*Deposition on one side of the substrate
|-
|-
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/thermalevaporator"