Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon: Difference between revisions
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[[Category: Thin Film Deposition|LPCVD Poly]] | [[Category: Thin Film Deposition|LPCVD Poly]] | ||
=Deposition of Silicon using LPCVD= | ==Deposition of Silicon using LPCVD== | ||
[[Image:A4_Furnace_PolySi.jpg|300x300px|thumb|4" polysilicon furnace (B4) located in cleanroom B-1]] | [[Image:A4_Furnace_PolySi.jpg|300x300px|thumb|4" polysilicon furnace (B4) located in cleanroom B-1]] | ||
[[Image:E2.JPG|300x300px|thumb|6" polysilicon furnace located (E2) in cleanroom E-6]] | [[Image:E2.JPG|300x300px|thumb|6" polysilicon furnace located (E2) in cleanroom E-6]] | ||
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==Process information== | ==Process information== | ||
*[[ | *[[/Standard recipes, QC limits and results for the 4" polysilicon furnace|Deposition of polysilicon using the B4 4" polysilicon furnace]] | ||
*[[/Boron doped poly-Si and a-Si |Boron doped poly-Si and a-Si by using 4" polysilicon furnace]] | *[[/Boron doped poly-Si and a-Si |Boron doped poly-Si and a-Si by using the B4 4" polysilicon furnace]] | ||
*[[/Phosphorous doped poly-Si|Phosphorous doped poly-Si using the B4 4" polysilicon furnace]] | |||
*[[ | *[[/Standard recipes, QC limits and results for the 6" polysilicon furnace|Deposition of polysilicon using the E2 6" polysilicon furnace]] | ||
*[[/Boron doped poly-Si |Boron doped poly-Si using 6" polysilicon furnace]] | *[[/Boron doped poly-Si |Boron doped poly-Si using the E2 6" polysilicon furnace]] | ||
==Overview of the performance of the LPCVD polysilicon processes and some process related parameters== | ==Overview of the performance of the LPCVD polysilicon processes and some process related parameters== | ||