Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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|style="background:Silver; color:black"|Thermocouple Control | |style="background:Silver; color:black"|Thermocouple Control | ||
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* RT to | * RT to 1000 <sup>o</sup>C | ||
|style="background:WhiteSmoke; color:black;" align="left"|Recommended '''up to 800 <sup>o</sup>C''', if '''forming gas''' is used. | |style="background:WhiteSmoke; color:black;" align="left"|Recommended '''up to 800 <sup>o</sup>C''', if '''forming gas''' is used. | ||
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More information and details about each type of processing - achievable using the RTP Annealsys tool - can be found in the following documents. | More information and details about each type of processing - achievable using the RTP Annealsys tool - can be found in the following documents. | ||
*[[Media:Report Updated.pdf|Report_Annealsys_Updated_February23 by Inês Diogo@DTU Nanolab]] | *[[index.php?title=Media:Report Updated.pdf|Report_Annealsys_Updated_February23 by Inês Diogo@DTU Nanolab]] | ||
*[http://hdl.handle.net/10362/152031 Rapid Thermal Processing and its Effects on High Aspect Ratio Silicon Features_October22 by Inês Diogo@DTU Nanolab@FCT NOVA] | *[http://hdl.handle.net/10362/152031 Rapid Thermal Processing and its Effects on High Aspect Ratio Silicon Features_October22 by Inês Diogo@DTU Nanolab@FCT NOVA] | ||
'''''Important!''''' The '''''RTO sequences''''' that were developed during the previous experimental work on the RTP Annealsys are '''''not available to users'''''. More tests and further investigation are required to prevent damaging the tool. | '''''Important!''''' The '''''RTO sequences''''' that were developed during the previous experimental work on the RTP Annealsys are '''''not available to users'''''. More tests and further investigation are required to prevent damaging the tool. | ||