Specific Process Knowledge/Etch/Wet Chromium Etch: Difference between revisions
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'''All measurements on this page has been made by Nanolab staff.''' | '''All measurements on this page has been made by Nanolab staff.''' | ||
[[Category:Equipment|Etch Wet Chromium]] | [[index.php?title=Category:Equipment|Etch Wet Chromium]] | ||
[[Category:Etch (Wet) bath|Chromium]] | [[index.php?title=Category:Etch (Wet) bath|Chromium]] | ||
==Wet etching of Chromium== | ==Wet etching of Chromium== | ||
[[Image:Fumehood1-2.jpg|300x300px|thumb|Fume hood 01 or 02 (for acids and bases) in cleanroom D-3 can be used for wet chromium etching.]] | [[Image:Fumehood1-2.jpg|300x300px|thumb|Fume hood 01 or 02 (for acids and bases) in cleanroom D-3 can be used for wet chromium etching.]] | ||
Wet etching of chromium at DTU Nanolab is done making your own set up in a beaker in a fume hood - preferably in D-3. You can see the APV [http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 here]. | Wet etching of chromium at DTU Nanolab is done making your own set up in a beaker in a fume hood - preferably in D-3. Make sure no other setup is present in the fume hood before you start. You can see the APV [http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 here]. | ||
We use the following solution to etch chromium: | We use the following solution to etch chromium: | ||
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PECVD SiO2 and LPCVD SiN coated wafers have been immersed in Cr etch 18 for 10min. Thickness wise: absolutely no changes (roughness after etch not measured) | PECVD SiO2 and LPCVD SiN coated wafers have been immersed in Cr etch 18 for 10min. Thickness wise: absolutely no changes (roughness after etch not measured) | ||
Normally the etch is reused (if you etch Molybdenum never reuse), but if you need to dispose it, collect it in a bottle marked | Normally the etch is reused (if you etch Molybdenum never reuse), but if you need to dispose it, collect it in a bottle marked X waste. | ||
===Overview of the chromium etch process=== | ===Overview of the chromium etch process=== | ||