Jump to content

Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions

Mmat (talk | contribs)
mNo edit summary
Bghe (talk | contribs)
 
(6 intermediate revisions by 3 users not shown)
Line 3: Line 3:
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD  click here]''' <br>
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD  click here]''' <br>


[[Category: Equipment|Thin film PECVD]]
[[Category: Thin Film Deposition|PECVD]]


==PECVD Plasma Enhanced Chemical Vapor Deposition==
==PECVD Plasma Enhanced Chemical Vapor Deposition==
Line 30: Line 28:
*[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]]
*[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]]


*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]]<br />
 
 
 
 
 
 
<br clear="all" />
 
==Overview of the performance of PECVD thin films and some process related parameters==
==Overview of the performance of PECVD thin films and some process related parameters==


Line 110: Line 99:
*NH<sub>3</sub>:0-1000 sccm
*NH<sub>3</sub>:0-1000 sccm
*N<sub>2</sub>:0-3000 sccm
*N<sub>2</sub>:0-3000 sccm
*GeH<sub>4</sub>:0-6.00 sccm
*5%PH<sub>3</sub>:0-60 sccm
*5%PH<sub>3</sub>:0-60 sccm
*3%B<sub>2</sub>H<sub>6</sub>:0-1000 sccm
*3%B<sub>2</sub>H<sub>6</sub>:0-200 sccm
|
|
*SiH<sub>4</sub>:0-60 sccm
*SiH<sub>4</sub>:0-60 sccm
*N<sub>2</sub>O:0-3000 sccm
*N<sub>2</sub>O:0-3000 sccm
*NH<sub>3</sub>:0-400 sccm
*NH<sub>3</sub>:0-287 sccm
*N<sub>2</sub>:0-3000 sccm
*N<sub>2</sub>:0-3000 sccm
*Ar:0-1000 sccm
*Ar:0-1415 sccm
*He: 200sccm
*5%PH<sub>3</sub>:0-100 sccm
*5%PH<sub>3</sub>:0-100 sccm
*3%B<sub>2</sub>H<sub>6</sub>:0-850 sccm
*3%B<sub>2</sub>H<sub>6</sub>:0-270 sccm
|-
|-
!style="background:silver; color:black" align="left" rowspan="3" valign="top" |Substrates
!style="background:silver; color:black" align="left" rowspan="3" valign="top" |Substrates