Specific Process Knowledge/Thin film deposition/Physimeca: Difference between revisions

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 Physimeca is a system for deposition of metals through electron-beam evaporation.
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 [http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=151 Physimeca in LabManager]
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 ==Equipment performance and process related parameters Physimeca==
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 '''*''' ''For thicknesses above 2000 Å special permission is required (contact thinfilm@nanolab.dtu.dk).''
-== [[/Physimeca_calibration|Calibration of Physimeca]] '' - for experienced users only'' ==
+==Calibration of Physimeca (''experienced users only'')==
+As of 16/6/2008, we will use a new system to compensate for "drift" without having to change e.g. 20 gold programs for each refilling.
+The power setting during deposition is a fraction of the "auto-emission current" on the genius system.
+In order to compensate for drift in the system the auto and max emission current on the genius is adjusted to achieve the rates at the set powers below
+This way it should not be necessary to adjust the programs every time, but experienced users will have to occasionally adjust the genius setting.
+{| border="2" cellspacing="0" cellpadding="4"
+| rowspan=2 |Reference deposition (step)
+| rowspan=2 |Material
+| rowspan=2 |Pocket
+| rowspan=2 |Rate (Å/s)
+| rowspan=2 |At power (%)
+| colspan="2" align="center"| Example of max emission current (6-2008)
+|-
+| mA
+| ~mA for rate
+|-
+| Ti100nm-5A-cal
+| Ti
+| 1
+| 5
+| 70
+| 160
+| 112
+|-
+| Pt100nm-5A-cal
+| Pt
+| 2
+| 5
+| 80
+| 460
+| 368
+|-
+| Au100nm-10A-cal
+| Au
+| 3
+| 10
+| 80
+| 450
+| 360
+|-
+| Ni100nm-5A-cal
+| Ni
+| 4
+| 5
+| 70
+| 250
+| 175
+|-
+| Ge100nm-5A-cal
+| Ge
+| 5
+| 5
+| 70
+| 190
+| 133
+|-
+| Cr100nm-5A-cal
+| Cr
+| 6
+| 5
+| 70
+| 110
+| 77
+|-
+| Pd100nm-5A-cal
+| Pd
+| 6
+| 5
+| 70
+| 160
+| 112
+|-
+|}
+The tooling factor has been determined to ~110 for 100nm layers (lot, 6-2008). It will of course have a small dependence on material and rate.
+You can use the steps above as starting point when making new programs (other thicknesses, rates, tilt etc.)
+== Changing Auto and Emission Current (''experienced users only'') ==
+If the actual power during deposition is significantly different than the target value (e.g. off by a few % you may change the genius values).
+Calculate new auto emission current: Inew="good" current during deposition / target power, e.g. 167mA/0.7 = 240mA (new max emission)
+# Use genius remote:
+# Switch to manual mode.
+# Switch to chosen material
+# Go to set data and down to auto emission and max emission .
+# Change both to the new value and note this in the user log.
+# Go to save/load and save values
+# Switch back to remote mode on genius.