Specific Process Knowledge/Characterization/Thickness Measurer: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Thickness_Measurer click here]''' | ||
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The user manual, technical information and contact information can be found in | |||
[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=198 LabManager]. | |||
==Quality Control - Recipe Parameters and Limits== | ==Quality Control - Recipe Parameters and Limits== | ||
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*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=198 The newest QC data]<br> | *[https://labmanager.dtu.dk/view_binary.php?type=data&mach=198 The newest QC data]<br> | ||
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==Equipment performance and process related parameters== | ==Equipment performance and process related parameters== | ||
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Latest revision as of 15:16, 2 June 2025
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Thickness Measurer

There are 2 thickness measurers in the cleanroom, both positioned in cleanroom D-3. The Thickness measurer is for measuring all sorts of samples. The thickness measurer (wafers) is solely for measuring the thickness of wafers or depths of grooves on wafers.
During a KOH etch it can be helpful to ensure no over-etching by making a thickness measurement during the etching.
The user manual, technical information and contact information can be found in
LabManager.
Quality Control - Recipe Parameters and Limits
| Quality Control (QC) for the Thickness measurer |
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The measured standard thickness is 0.1 mm. The measured result has to be within ± 0.005 mm. The QC is preformed once a year. |
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Purpose |
Thickness measurer |
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|---|---|---|
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Performance |
Thickness resolution |
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Substrates |
Batch size |
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| Substrate materials allowed |
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Purpose |
Thickness measurer (wafers) |
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|---|---|---|
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Performance |
Thickness resolution |
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Substrates |
Batch size |
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| Substrate materials allowed |
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