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Specific Process Knowledge/Characterization/Thickness Measurer: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Thickness_Measurer click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Thickness_Measurer click here]'''  
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'''The user manual, technical information and contact information can be found in LabManager:'''
The user manual, technical information and contact information can be found in  
 
[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=198 LabManager].
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=198 Thickness measurer]'''
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=447 Thickness measurer (wafers)]'''


==Quality Control - Recipe Parameters and Limits==
==Quality Control - Recipe Parameters and Limits==
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*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=198 The newest QC data]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=198 The newest QC data]<br>
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==Equipment performance and process related parameters==
==Equipment performance and process related parameters==
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Latest revision as of 15:16, 2 June 2025

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

Feedback to this page: click here

Thickness Measurer

Thickness Measurer. Positioned in cleanroom D-3

There are 2 thickness measurers in the cleanroom, both positioned in cleanroom D-3. The Thickness measurer is for measuring all sorts of samples. The thickness measurer (wafers) is solely for measuring the thickness of wafers or depths of grooves on wafers.

During a KOH etch it can be helpful to ensure no over-etching by making a thickness measurement during the etching.


The user manual, technical information and contact information can be found in LabManager.

Quality Control - Recipe Parameters and Limits

Quality Control (QC) for the Thickness measurer

The measured standard thickness is 0.1 mm. The measured result has to be within ± 0.005 mm. The QC is preformed once a year.



Equipment performance and process related parameters

Purpose

Thickness measurer

  • Wafer thickness
  • Depths of larger grooves
  • Heigth of larger samples

Performance

Thickness resolution

  • < 1 µm

Substrates

Batch size

  • One sample
Substrate materials allowed
  • No restrictions


Purpose

Thickness measurer (wafers)

  • Wafer thickness
  • Depths of larger grooves

Performance

Thickness resolution

  • < 1 µm

Substrates

Batch size

  • One sample
Substrate materials allowed
  • Only wafers