Specific Process Knowledge/Characterization/Stress measurement: Difference between revisions

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 #Measure the thickness of the wafer
 #Deposit the thin film
-#Make a pre-stress measurement. Measure the wafer bow on one of the profilometers ([[Specific Process Knowledge/Characterization/Dekatk_XTA|Dektak XTA]] or [[Specific Process Knowledge/Characterization/Tencor P17|/Tencor P17]]). Save the measurement. It is a good idea to measure across most of the wafer (at least along 70% of the wafer length) in two directions perpendicular to each other. Using the P17 profiler you can also measure a radially resolved map of the wafer stress with up to 5° resolution.
+#Make a pre-stress measurement. Measure the wafer bow on one of the profilometers ([[Specific Process Knowledge/Characterization/Dektak XTA|Dektak XTA]] or [[Specific Process Knowledge/Characterization/Tencor P17|/Tencor P17]]). Save the measurement. It is a good idea to measure across most of the wafer (at least along 70% of the wafer length) in two directions perpendicular to each other. Using the P17 profiler you can also measure a radially resolved map of the wafer stress with up to 5° resolution.
 #Remove the thin film from one side of the wafer. If it is a single side polished wafer, then remove it on the non-polished side.
 #Make a post-stress measurement. Measure the wafer bow again:
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 Nanolab has the [[Specific_Process_Knowledge/Characterization/XRD/SLSII_analysis|SmartLab Studio software]] and the Malvern Panalytical HighScore software available for quantifying the stress (ask staff for details). There is a good summary of the principles of the strain calculation in the last section of the [https://labmanager.dtu.dk/view_binary.php?fileId=4247 associated help document] for the SmartLab Studio software.
-You may be able to measure the relaxed lattice directly rather than comparing to a theoretical lattice, but you would have to be able to release the film and measure it separately (if this means scraping the thin film off your sample mechanically, you could potentially measure it in the [[Specific_Process_Knowledge/Characterization/XRD/XRD Powder|XRD Powder]], but it would probably be difficult to get enough powder to get a good signal).
+You may be able to measure the relaxed lattice directly rather than comparing to a theoretical lattice, but you would have to be able to release the film and measure it separately (if this means scraping the thin film off your sample mechanically, you could potentially measure it in the [[Specific Process Knowledge/Characterization/XRD/XRD SmartLab 9kW Rotating Anode|XRD Rot Anode]], though it may be difficult to get enough powder).