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{{cc-nanolab}
to be deleted, info copied to pages with respective tool name


'''Feedback to this page''': '''[mailto:Characterization@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Profiler click here]'''
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Dektak_XTA


[[Category: Equipment|Characterization Profiler]]
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Tencor_P17
[[Category: Characterization|Profiler]]


DektakXTA info copied to
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Sensofar_S_Neox
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Dektak_XTA#Performance_and_Process_Parameters


copied to
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Filmetrics
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Tencor_P17#Tencor_P17_Stylus_Profiler


==Optical Profiler (Sensofar S Neox) ==
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Dektak_3ST
{{CC-bghe2}}
[[image:IMG_4555.JPG|275x275px|right|thumb|Optical Profiler (Sensofar): positioned in the clean room C-1), {{photo1}}]]


The Sensofar S Neox 3D Optical Profiler has a sensor head that combines confocal, interferometry and focus variation techniques  as well as thick and thin film measurement capabilities.
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Dektak_150
 
The Neox sensor head provides standard microscope imaging, confocal imaging, confocal profiling, PSI (Phase Shift Interferometry), CSI (Coherence Scanning Interferometry), Active illumination (Ai) Focus Variation and high resolution thin film thickness measurements on a single instrument.
 
The main purpose is 3D topographic imaging of surfaces, step height measurements in smaller trenches/holes than can be obtained with standard stylus methods (i.e. with aspect ratios higher that 1:1), roughness measurements with larger FOV (Field Of View) than the AFM, but less horisontal resolution.
 
For most samples the optical profiler provides fast and easy information without any sample preparation. However, it can be necessary to cover thin transparent layers (< 2 µm) with a thin layer of metal.
 
The resolution is limited by the objectives and the pixel resolution.
[[Image:3D examples.JPG|200px|right|thumb|From the Sensofar Metrology, used with permission]]
 
'''Analysis software:'''
*Free analysis software for visualizing and analyzing AFM and Optical profiler files (Sensofar) [http://gwyddion.net Gwyddion]
*SensoView software from Sensfar want also be downloaded for all users: U:\Nlab\CleanroomDrive\_Equipment\Optical profiler Sensofar\SensoVIEW 1.6.0
*We have an extra license to the more advanced SensoMap software. As a user of the system you can access this by remote desktop here: DTU-8CC0321MFL. You log in using your DTU login.
 
 
'''The user manual, technical information (SensoSCAN and SensoVIEW manuals) and contact information can be found in LabManager (requires login):'''
 
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=491 Optical profiler (Sensofar S Neox) info page in LabManager]
 
 
===Process Information===
 
*[https://labmanager.dtu.dk/view_binary.php?fileId=5345| Sensofar presentation on how the sensofar works (for the previous system but the techniques are the same)] -requires login
*[https://labmanager.dtu.dk/view_binary.php?fileId=5346|S Neox leaflet including specifications] - requires login
*Acceptance measurements on the S Neox Sensofar: [[Media:Acceptance measurements on Nanolab samples.pdf]], measured at the acceptances test by Sensofar and Berit Herstrøm@ DTU Nanolab
*[[/Optical Profiler (Sensofar) acceptance test|Results from the Optical Profiler (Sensofar) acceptance test - for the previous system - expired!!]]
 
===Equipment performance and process related parameters===
 
{| border="2" cellspacing="0" cellpadding="10"
 
!colspan="2" border="none" style="background:silver; color:black;" align="center"|<b>Equipment</b>
|style="background:WhiteSmoke; color:black"|<b>Optical profiler</b>
|-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|3D topographic imaging of surfaces.||style="background:WhiteSmoke; color:black"|
*3D imaging of surfaces
*Roughness measurements
*Step height measurements
*3D topographic measurements
*Thick and thin film thickness measurements in small spots
|-
!style="background:silver; color:black;" align="left"|Posibilities
|style="background:LightGrey; color:black"|Confocal, interferometric and AI focus variation tophography and reflectometry
*Standard microscope imaging
*Confocal imaging
*Confocal profiling
*PSI (Phase Shift Interferometry)
*CSI (Coherence Scanning Interferometry)
*Active illumination (Ai) Focus Variation
*High resolution thin film thickness measurement using reflectrometry
*Stitched scans
*Wafer mapping
|style="background:WhiteSmoke; color:black"|
 
[[image:Techniques overview.JPG|thumb|center|From the Sensofar S Neox 3D optical profiler brochure, used with permission]]
|-
!style="background:silver; color:black" align="left"|Performance
|style="background:LightGrey; color:black"|Depending on the objective chosen||style="background:WhiteSmoke; color:black"|
*See the performance of the different objectives here:
[[image:Objectives01.JPG|600px|Objectives01.JPG]]
|-
|-
!style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Substrates no bigger than 150 mm x 150mm
|-
|style="background:silver; color:black"|
| style="background:LightGrey; color:black"|Substrate materials allowed
|style="background:WhiteSmoke; color:black"|
*In principle all materials as long as they are allowed in the cleanroom outside fumehoods - no liquids!
|-
|}
 
==Optical Profiler (Filmetrics)==
{{CC-bghe2}} <br>
[[image:Scanner without anotation.jpg|275x275px|right|thumb|Optical Profiler (Filmetrics): positioned in the basement (346-904), {{photo1}}]]
 
The Profilm3D optical profiler from Filmetrics uses white-light-interferometry (WLI) and phase-shifting-interferometry (PSI) to produce surface profiles and depth-of-field color images.
 
The main purpose is 3D topographic imaging of surfaces, step height measurements and roughness measurements with larger FOV (Field Of View) than the AFM, but less horisontal resolution.
 
For most samples the optical profiler provides fast and easy information without any sample preparation. However, it can be necessary to cover thin transparent layers (< 2 µm) with a thin layer of metal.
 
The resolution is limited by the objective and the sampling resolution.
 
 
'''The user manual, technical information and contact information can be found in LabManager (requires login):'''
 
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=467 Optical profiler (Filmetrics) info page in LabManager]
 
 
 
===Equipment performance and process related parameters===
 
{| border="2" cellspacing="0" cellpadding="10"
 
!colspan="2" border="none" style="background:silver; color:black;" align="center"|<b>Equipment</b>
|style="background:WhiteSmoke; color:black"|<b>Optical profiler</b>
|-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|3D topographic imaging of surfaces.||style="background:WhiteSmoke; color:black"|
*3D imaging of surfaces
*Roughness measurements
*Step height measurements
*3D topographic measurements
|-
!style="background:silver; color:black;" align="left"|Posibilities
|style="background:LightGrey; color:black"|Interferometric profiling||style="background:WhiteSmoke; color:black"|
*Standard microscope imaging
*PSI (Phase Shift Interferometry)
*WLI (White light Interferometry)
*Stitched scans
*Wafer mapping
|-
!style="background:silver; color:black" align="left"|Performance
|style="background:LightGrey; color:black"|With the current 10x objective||style="background:WhiteSmoke; color:black"|
[https://labmanager.dtu.dk/view_binary.php?fileId=4174 See here the data sheet for this instrument (requires login)]]
|-
|-
!style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Substrates no bigger than 100 mm x 100mm
|-
|style="background:silver; color:black"|
| style="background:LightGrey; color:black"|Substrate materials allowed
|style="background:WhiteSmoke; color:black"|
*In principle all materials
|-
|}
 
== Dektak 3ST ==
 
 
[[image:III-V profiler.JPG|300x300px|right|thumb|The profiler placed in 346-904 (Dektak 3ST).]]
 
The Dektak 3ST is intended for profile measurements on samples outside the cleanroom. It is located in the basement, building 346, room 904.
 
 
'''The user manual, technical information and contact information can be found in LabManager:'''
 
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=184 Dektak 3ST (Dektak) in LabManager]
 
The computer connected to the Dektak 3ST is pretty old and runs Windows 98 SE. It is not connected to the network but traces can be saved on either USB memory stick or floppy disk. The USB driver is an old universal driver and has been shown to work with small size USB sticks. However it did not work with an 8GB Kingston stick.
 
===Equipment performance and process related parameters===
{| border="2" cellspacing="0" cellpadding="10"
|-
!style="background:silver; color:black" align="left" rowspan="4" valign="top" |Performance
|style="background:LightGrey; color:black"|Vertical Range
|style="background:WhiteSmoke; color:black"|
*65 kÅ, 655 kÅ, 1310 kÅ
|-
|style="background:LightGrey; color:black"|Scan length range
|style="background:WhiteSmoke; color:black"|
*50-50000 µm
|-
|style="background:LightGrey; color:black"|Stylus track force
|style="background:WhiteSmoke; color:black"|
*Recommended: 3-10 mg, depending on the softness of the surface
|-
|style="background:LightGrey; color:black"|Scan speed ranges
|style="background:WhiteSmoke; color:black"|
*High speed: 3s for 50µm to 50000µm
*Medium speed: 12s for 50µm to 10000µm
*Low speed: 50s
|-
!style="background:silver; color:black" align="left" rowspan="1" valign="top" |Materials
|style="background:LightGrey; color:black"|Allowed substrate materials
|style="background:WhiteSmoke; color:black"|
*III-V
* Silicon
* polymer
|}
 
== Stylus Profiler: Dektak150 ==
 
 
[[image:Dektak150.JPG|300x300px|right|thumb|Stylus profiler:Dektak150, currently located in building 451, room 913 (as of 2023).]]
 
The stylus profiler Dektak150 is intended for profile measurements on samples outside the cleanroom. The Dektak150 is especially well suited for measuring soft samples as it can be adjusted to apply lower force than the other stylus profilers at Nanolab.
 
 
'''The user manual, technical information and contact information can be found in LabManager:'''
 
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=457  Stylus profiler:Dektak150 in LabManager]
 
The computer is not connected to the network but data can be saved on a dedicated USB and transfered to a computer on the network.
 
Info about measurement accuracy can be found [[/Stylus profiler measurement uncertainty|here]].
 
===Equipment performance and process related parameters===
 
{| border="2" cellspacing="0" cellpadding="10"
|-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|Profiler for measuring micro structures|
|style="background:WhiteSmoke; color:black"|
*Single line profiles
*Surface roughness on a line scan
|-
!style="background:silver; color:black;" align="left"|Location
|style="background:LightGrey; color:black"|Building 347, room 080
|style="background:WhiteSmoke; color:black"|
*North-East corner of the building, in the basement
*When you enter the building from the East, you enter directly into the basement.
|-
!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Performance
|style="background:LightGrey; color:black"|Scan range x y
|style="background:WhiteSmoke; color:black"|
Line scan x: 50 µm to 55 mm in a single scan
|-
|style="background:LightGrey; color:black"|Scan range z
|style="background:WhiteSmoke; color:black"|
50 Å to 1 mm
|-
|style="background:LightGrey; color:black"|Resolution x y
|style="background:WhiteSmoke; color:black"|
Theoretically down to 0.003 µm (in practice the resolution is limited by the tip size)
|-
|style="background:LightGrey; color:black"|Resolution z
|style="background:WhiteSmoke; color:black"|
1Å (@65kÅ), 10Å (@655 kÅ), 80 Å (@5240 kÅ), 160 Å (@1mm)
|-
|style="background:LightGrey; color:black"|Maximum sample thickness
|style="background:WhiteSmoke; color:black"|
100 mm
|-
|-
!style="background:silver; color:black" align="left"|Hardware settings
|style="background:LightGrey; color:black"|Tip radius
|style="background:WhiteSmoke; color:black"|
*5 µm 45<sup>o</sup> cone
*0.2 µm 45<sup>o</sup> cone on request
|-
!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Up to 6"
|-
| style="background:LightGrey; color:black"|Substrate materials allowed
|style="background:WhiteSmoke; color:black"|
*In principle all materials
|-
|}
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