Specific Process Knowledge/Thermal Process/C2 Furnace General Purpose Annealing: Difference between revisions
Created page with "'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/C2_Furnace_III-V_oxidation click here]''' ''This page is written by DTU Nanolab internal'' ==General Purpose Annealing furnace (C2) == The General Purpose Annealing furnace (C2) is a Tempress horizontal furnace located in the furnace C stack. The furnace has from September 2024 become..." |
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|style="background:LightGrey; color:black"|Standby temperature | |style="background:LightGrey; color:black"|Standby temperature | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*250 <sup>o</sup>C/s | *250 <sup>o</sup>C/s (minimum sample loading temperature) | ||
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|style="background:LightGrey; color:black"|Process pressure | |style="background:LightGrey; color:black"|Process pressure | ||