Specific Process Knowledge/Imprinting: Difference between revisions
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= Nano | = Nano Imprint Lithography = | ||
Nano Imprint Lithography, similar to Hot Embossing, is a parallel transfer of a pattern made by a serial technique (often e-beam). First a stamp is made, usually in Si or SiO<math>\rm{_2}</math> however other materials could also be used. The pattern on the stamp is then transferred to a polymer (on a different substrate), by heating both stamp and substrate to above the glass transition temperature T<math>_g</math> of the polymer and then pressing the stamp and the substrate together, hence deforming the polymer on the substrate. The stamp and substrate are then cooled down and only separated when the temperature is well below T<math>_g</math> of the polymer. Normally the stack is often cooled to room temperature to easily separate the two parts. | Nano Imprint Lithography, similar to Hot Embossing, is a parallel transfer of a pattern made by a serial technique (often e-beam). First a stamp is made, usually in Si or SiO<math>\rm{_2}</math> however other materials could also be used. The pattern on the stamp is then transferred to a polymer (on a different substrate), by heating both stamp and substrate to above the glass transition temperature T<math>_g</math> of the polymer and then pressing the stamp and the substrate together, hence deforming the polymer on the substrate. The stamp and substrate are then cooled down and only separated when the temperature is well below T<math>_g</math> of the polymer. Normally the stack is often cooled to room temperature to easily separate the two parts. | ||
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== Stamp for imprint == | == Stamp for imprint == | ||
A stamp for imprint lithography is usually made in Si or SiO, however other materials could also be used. | A stamp for imprint lithography is usually made in Si or SiO, however other materials could also be used. | ||
Here is a process flow for stamp made of SU8 resist.[[ | Here is a process flow for stamp made of SU8 resist.[[Media:Stamp Fabrication.docx| Stamp fabrication flow.]] | ||
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== Choose an Equipment == | == Choose an Equipment == | ||
*[[Specific_Process_Knowledge/Lithography/NanoImprintLithography#EVG_NIL|Imprinter 01]] - ''Tool to Imprint'' | |||
*[[Specific Process Knowledge/Thin_film_deposition/MVD|MVD]] - Molecular Vapor Deposition - ''Tool to deposit an antistiction coating for silicon or metal stamps'' | *[[Specific Process Knowledge/Thin_film_deposition/MVD|MVD]] - Molecular Vapor Deposition - ''Tool to deposit an antistiction coating for silicon or metal stamps'' | ||
*[[Specific Process Knowledge/Characterization/Drop Shape Analyzer|Drop Shape Analyzer]] - ''Tool to measure the hydrophobicity of the antistiction layer'' | *[[Specific Process Knowledge/Characterization/Drop Shape Analyzer|Drop Shape Analyzer]] - ''Tool to measure the hydrophobicity of the antistiction layer'' | ||