Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions
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== nano1.42 versus pxnano2 == | == nano1.42 versus pxnano2 == | ||
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<gallery caption="The results" widths="500" heights="350" perrow="2"> | <gallery caption="The results" widths="500" heights="350" perrow="2"> | ||
image:WF_2E09a_mar23_2011-030.jpg|The 30 nm trenches etched 120 seconds | image:WF_2E09a_mar23_2011-030.jpg|'''nano1.42:''' The 30 nm trenches etched 120 seconds | ||
image:WF_2E09b_mar23_2011-030.jpg|The 30 nm trenches etched 96 seconds | image:WF_2E09b_mar23_2011-030.jpg|'''pxnano2:''' The 30 nm trenches etched 96 seconds | ||
image:WF_2E09a_mar23_2011-060.jpg|The 60 nm trenches etched 120 seconds | image:WF_2E09a_mar23_2011-060.jpg|'''nano1.42:''' The 60 nm trenches etched 120 seconds | ||
image:WF_2E09b_mar23_2011-060.jpg|The 60 nm trenches etched 96 seconds | image:WF_2E09b_mar23_2011-060.jpg|'''pxnano2:''' The 60 nm trenches etched 96 seconds | ||
image:WF_2E09a_mar23_2011-090.jpg|The 90 nm trenches etched 120 seconds | image:WF_2E09a_mar23_2011-090.jpg|'''nano1.42:''' The 90 nm trenches etched 120 seconds | ||
image:WF_2E09b_mar23_2011-090.jpg|The 90 nm trenches etched 96 seconds | image:WF_2E09b_mar23_2011-090.jpg|'''pxnano2:''' The 90 nm trenches etched 96 seconds | ||
image:WF_2E09a_mar23_2011-120.jpg|The 120 nm trenches etched 120 seconds | image:WF_2E09a_mar23_2011-120.jpg|'''nano1.42:''' The 120 nm trenches etched 120 seconds | ||
image:WF_2E09b_mar23_2011-120.jpg|The 120 nm trenches etched 96 seconds | image:WF_2E09b_mar23_2011-120.jpg|'''pxnano2:''' The 120 nm trenches etched 96 seconds | ||
image:WF_2E09a_mar23_2011-150.jpg|The 150 nm trenches etched 120 seconds | image:WF_2E09a_mar23_2011-150.jpg|'''nano1.42:''' The 150 nm trenches etched 120 seconds | ||
image:WF_2E09b_mar23_2011-150.jpg|The 150 nm trenches etched 96 seconds | image:WF_2E09b_mar23_2011-150.jpg|'''pxnano2:''' The 150 nm trenches etched 96 seconds | ||
</gallery> | </gallery> | ||
{| {{table}} align="left" | |||
{| {{table}} | |+ nano1.42 on the Pegasus | ||
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | | align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | ||
| align="center" style="background:#f0f0f0;"|'''''' | | align="center" style="background:#f0f0f0;"|'''''' | ||
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| zep||nm/min||||||||||||66|| | | zep||nm/min||||||||||||66|| | ||
|- | |- | ||
| || | |} | ||
| | {| {{table}} align="center" | ||
| Nominal trench line width||||30||60||90||120||150||Average||Std. dev. | |+ pxnano2 on the ASE | ||
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | |||
| align="center" style="background:#f0f0f0;"|'''''' | |||
| align="center" style="background:#f0f0f0;"|'''30''' | |||
| align="center" style="background:#f0f0f0;"|'''60''' | |||
| align="center" style="background:#f0f0f0;"|'''90''' | |||
| align="center" style="background:#f0f0f0;"|'''120''' | |||
| align="center" style="background:#f0f0f0;"|'''150''' | |||
| align="center" style="background:#f0f0f0;"|'''Average''' | |||
| align="center" style="background:#f0f0f0;"|'''Std. dev.''' | |||
|- | |- | ||
| Etch rates||nm/min||215||232||240||243||244||235||12 | | Etch rates||nm/min||215||232||240||243||244||235||12 | ||