Specific Process Knowledge/Wafer cleaning: Difference between revisions
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== Cleaning of wafers == | == Cleaning of wafers == | ||
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===Items that have been outside the cleanroom=== | ===Items that have been outside the cleanroom=== | ||
Before bringing samples into the cleanroom you have to get approval from Nanolab. The approval process and cleaning procedure is described on [[Specific_Process_Knowledge/Wafer_cleaning/ | Before bringing samples into the cleanroom you have to get approval from Nanolab ("Bring samples into cleanroom"-procedure). The approval process and cleaning procedure is described on <b>[[Specific_Process_Knowledge/Wafer_cleaning/Bring_samples_into_Cleanroom_or_PolyFabLab| here]]</b>. Please note that the approval for bringing samples into the cleanroom is personal (and fellow group members need to send in seperate request). | ||
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===Masks=== | ===Masks=== | ||
Masks that have become dirty by dust particles or resist residues have to be cleaned in the 7-up (mask) bath before use. | Masks that have become dirty by dust particles or resist residues have to be cleaned in the 7-up (mask) bath before use. You can find more information [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha here]. | ||
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