Specific Process Knowledge/Lithography/nLOF: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/nLOF click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/nLOF click here]''' | ||
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The recommended PEB for nLOF is 60 seconds at 110°C, regardless of resist film thickness. | The recommended PEB for nLOF is 60 seconds at 110°C, regardless of resist film thickness. | ||
===PEB baking time investigation=== | ===PEB baking time investigation=== | ||