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Specific Process Knowledge/Lithography/nLOF: Difference between revisions

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{{:Specific Process Knowledge/Lithography/authors_generic}}
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/nLOF click here]'''
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*PEB time: 60 s
*PEB time: 60 s


 
The manufacturer recommended PEB for nLOF is 60 seconds at 110°C, regardless of resist film thickness.
The recommended PEB for nLOF is 60 seconds at 110°C, regardless of resist film thickness.
 


===PEB baking time investigation===
===PEB baking time investigation===