Specific Process Knowledge/Lithography/SU-8: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/SU-8 click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/SU-8 click here]''' | ||
[[Category: Lithography|Resist]] | [[index.php?title=Category:Lithography|Resist]] | ||
[[Category: Resist|SU-8]] | [[index.php?title=Category:Resist|SU-8]] | ||
__TOC__ | __TOC__ | ||
==Resist description== | ==Resist description== | ||
SU-8 is an epoxy based negative i-line photoresist with a high contrast. More | SU-8 is an epoxy based negative i-line photoresist with a high contrast. More than 10:1 aspect ratio imaging with vertical sidewalls is one of the widely used properties of this resist. It also has high chemical, plasma and temperature resistance after curing which makes it well suited for permanent use applications. | ||
<span style="color:red">'''Note:''' Since the SU-8 is epoxy-based, users are required to take the mandatory epoxy safety course "Personlig sikkerhed ved arbejde med epoxy". Registration to this course can be found on [https://www.inside.dtu.dk/en/medarbejder/hr-og-arbejdsmiljoe/kompetenceudvikling/kursusoversigt_overside/kursusoversigt/arbejdsmiljoe-og-beredskabskurser/epoxy-kursus?fs=1 DTU Inside]</span> - '''requires login''' | <span style="color:red">'''Note:''' Since the SU-8 is epoxy-based, users are required to take the mandatory epoxy safety course "Personlig sikkerhed ved arbejde med epoxy". Registration to this course can be found on [https://www.inside.dtu.dk/en/medarbejder/hr-og-arbejdsmiljoe/kompetenceudvikling/kursusoversigt_overside/kursusoversigt/arbejdsmiljoe-og-beredskabskurser/epoxy-kursus?fs=1 DTU Inside]</span> - '''requires login''' | ||
In the cleanroom the SU-8 2000 product line is widely used, where the '''SU-8 2005''', '''SU-8 2035''', and '''SU-8 2075''' are supplied by Nanolab. | In the cleanroom the SU-8 2000 product line is widely used, where the '''SU-8 2005''', '''SU-8 2035''', and '''SU-8 2075''' are supplied by Nanolab. | ||
Considering discontinuation of the SU-8 2000 series we need to move to another product. | Considering discontinuation of the SU-8 2000 series we need to move to another product. | ||
Kayaku Advanced Materials, USA (KAM)v has following recommendation: | |||
Current Product Target Coat Thickness Recommended Product | |||
SU-8 2010 or less ≤ 10 μm SU-8 3000 or SU-8 TF 6000 series | |||
SU-8 2010 through SU-8 2050 10 μm ≤ x ≤ 50 μm SU-8 3000 series | |||
SU-8 2075 or greater > 50 μm SU-8 XFT75 & SU-8 XFT100 | SU-8 2075 or greater > 50 μm SU-8 XFT75 & SU-8 XFT100 | ||
After an internal conversation we have decided to try new followings products: | After an internal conversation we have decided to try new followings products: | ||
SU8 3005 instead of SU8 2005 | |||
SU8 3035 instead of SU8 2035 | SU8 3005 instead of SU8 2005 [https://kayakuam.com/products/su-8-3000/ Product information] | ||
SU8 XFT75 instead of SU8 2075 | |||
And we will also try a new formulation SU8 3025. | SU8 3035 instead of SU8 2035 [https://kayakuam.com/products/su-8-3000/ Product information] | ||
SU8 XFT75 instead of SU8 2075 [https://kayakuam.com/su8xft/ Product information] | |||
And we will also try a new formulation SU8 3025. [https://kayakuam.com/products/su-8-3000/ Product information] | |||
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* Dispense manually from bottle/syringe for the thin resists or use a syringe dispense system for the thick resists | * Dispense manually from bottle/syringe for the thin resists or use a syringe dispense system for the thick resists | ||
* Use static dispense; approximately 1 ml of SU-8 per inch of substrate diameter | * Use static dispense; approximately 1 ml of SU-8 per inch of substrate diameter | ||
* For SU-8 layers thicker | * For SU-8 layers thicker than 100 um use two-step spin coating procedure: | ||
** 5 second spread cycle 500 rpm, acceleration 100 rpm/s, following by: | ** 5 second spread cycle 500 rpm, acceleration 100 rpm/s, following by: | ||
** thickness definition cycle with the final spin speed | ** thickness definition cycle with the final spin speed | ||
** layer uniformity of the thick films can be improved by using a rotation cover (Gyrset), but remember the speed limitation is then 3000 rpm | ** layer uniformity of the thick films can be improved by using a rotation cover (Gyrset), but remember the speed limitation is then 3000 rpm | ||
* For SU-8 layers thinner | * For SU-8 layers thinner than 10 um the spread cycle can be omitted to improve the uniformity of the films | ||
'''Spin curves:''' | '''Spin curves:''' | ||
Please notice that we do not have a spin curves for new formulations yet, but as soon as we have available data based on our experiments from cleanroom we will publish it. | |||
Spin curves for SU-8 2002 and SU-8 2005 (from the old KS Spinner): | Spin curves for SU-8 2002 and SU-8 2005 (from the old KS Spinner): | ||
[[File:SU8 spinCurves 2002 2005.png|640px|thumb|right|Spin curves for SU-8 2002 and SU-8 2005.]] | [[File:SU8 spinCurves 2002 2005.png|640px|thumb|right|Spin curves for SU-8 2002 and SU-8 2005.]] | ||