Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
| (6 intermediate revisions by 2 users not shown) | |||
| Line 10: | Line 10: | ||
__TOC__ | __TOC__ | ||
=UV lithography= | |||
UV Lithography uses ultraviolet light to transfer a pattern from a photo-mask, or a digital design file, to a substrate coated with photoresist. | UV Lithography uses ultraviolet light to transfer a pattern from a photo-mask, or a digital design file, to a substrate coated with photoresist. | ||
| Line 19: | Line 20: | ||
DTU Nanolab offers a number of automatic and manual coaters, mask or maskless exposure tools, as well as automatic or semi-automatic developers.<br clear=all /> | DTU Nanolab offers a number of automatic and manual coaters, mask or maskless exposure tools, as well as automatic or semi-automatic developers.<br clear=all /> | ||
= Getting started = | =Getting started with UV lithography= | ||
[[File:UVLPic1.png|450px|right]] | [[File:UVLPic1.png|450px|right]] | ||
| Line 53: | Line 54: | ||
# Development: Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this list]]</u>. Remember the development process influences the <u>[[Specific_Process_Knowledge/Lithography/Resist#UV_Resist|exposure dose]]</u> | # Development: Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this list]]</u>. Remember the development process influences the <u>[[Specific_Process_Knowledge/Lithography/Resist#UV_Resist|exposure dose]]</u> | ||
# Specify whether you wish to strip or lift-off your resist: <u>[[Specific_Process_Knowledge/Lithography/Strip|strip]]</u> and <u>[[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]</u> | # Specify whether you wish to strip or lift-off your resist: <u>[[Specific_Process_Knowledge/Lithography/Strip|strip]]</u> and <u>[[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]</u> | ||
==Mask Aligner versus Maskless Aligner== | |||
[[Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA|Mask Aligner vs Maskless Aligner]] | |||
<br clear=all /> | <br clear=all /> | ||
<!--- | |||
=Equipment and Process Pages= | =Equipment and Process Pages= | ||
{{:Specific Process Knowledge/Lithography/UVlithographyProcessPages}} | {{:Specific Process Knowledge/Lithography/UVlithographyProcessPages}} | ||
===[[Specific Process Knowledge/Lithography/Resist#UV_Resist|UV Resist]]=== | ===[[Specific Process Knowledge/Lithography/Resist#UV_Resist|UV Resist]]=== | ||
===[[Specific Process Knowledge/Lithography/Pretreatment|Pretreatment]]=== | ===[[Specific Process Knowledge/Lithography/Pretreatment|Pretreatment]]=== | ||
| Line 70: | Line 77: | ||
---> | ---> | ||
= | =Process information from our suppliers= | ||
MicroChemicals GmbH has a [https://www.microchemicals.com/downloads/application_notes.html very large online library] of information about UV lithography. | MicroChemicals GmbH has a [https://www.microchemicals.com/downloads/application_notes.html very large online library] of information about UV lithography. | ||
Of particular | Of particular interest is the [https://www.microchemicals.com/dokumente/application_notes/lithography_trouble_shooting.pdf lithography trouble-shooter] | ||