Specific Process Knowledge/Wafer cleaning/Cleaning with Soap Sonic: Difference between revisions
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If permission is granted the standard cleaning process for the approved substrates are | If permission is granted the standard cleaning process for the approved substrates are | ||
# | # Triton-X soap cleaning as described below | ||
# 10 min cleaning in a piranha solution (sulphuric acid and hydrogen peroxide) | # 10 min cleaning in a piranha solution (sulphuric acid and hydrogen peroxide) | ||