Specific Process Knowledge/Lithography: Difference between revisions
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=Equipment and Process Pages= | =Equipment and Process Pages= | ||
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=Lithography Tool Package Training= | |||
DTU Nanolab offers a Tool Package Training course for Lithography (TPT Lithography), which covers the basic theory of lithography as well as an introduction to some of the most used tools for lithographic processing. | |||
You are required to pass this course in order to become eligible for tool training on the lithography equipment in the cleanroom facility of DTU Nanolab. The course includes theory on lithographic processes and common equipment operation and consists of lecture videos followed by a quiz for each video. Once completed successfully, you may continue to the online equipment training for the specific lithography equipment you want to use. After completing the online equipment training, you can then request hands-on training for the equipment in the cleanroom via [mailto:training@nanolab.dtu.dk training@nanolab.dtu.dk]. | |||
The course is available via DTU Learn. You sign up for the course by enrolling yourself in the course [https://www.nanolab.dtu.dk/access/cleanroom-access/equipment-training/lithography-tool-training here] | |||
''' | '''TPT lithography course contents''' | ||
* | * Online lecture videos | ||
* | * Online quiz for each lecture video | ||
'''Learning objectives''' | '''Learning objectives''' | ||
* Coating | * Coating | ||
* Exposure | * Exposure | ||
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* Resist, substrates and pre-treatment | * Resist, substrates and pre-treatment | ||
* Post-lithography steps | * Post-lithography steps | ||
'''Course responsible''' | |||
'''Course | |||
* Jens Hindborg Hemmingsen | * Jens Hindborg Hemmingsen | ||
* Thomas Aarøe Anhøj | * Thomas Aarøe Anhøj | ||
If you have questions you can contact us via [mailto:lithography@nanolab.dtu.dk lithography@nanolab.dtu.dk] | If you have questions you can contact us via [mailto:lithography@nanolab.dtu.dk lithography@nanolab.dtu.dk] | ||
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=Knowledge and Information about Lithography= | =Knowledge and Information about Lithography= | ||
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'''<big>Manuals</big>''' | '''<big>Manuals</big>'''<br> | ||
''NB: Access to manuals require DTU login'' | ''NB: Access to manuals require DTU login'' | ||
*Automatic Spin Coater: [https://labmanager.dtu.dk/d4mb/show.php?dokId=4140&mach=359 Spin Coater: Gamma UV] | *Automatic Spin Coater: [https://labmanager.dtu.dk/d4mb/show.php?dokId=4140&mach=359 Spin Coater: Gamma UV] | ||
Latest revision as of 09:44, 15 April 2025
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Lithography
Lithography is a method used for transferring a pattern from a physical or digital mask onto the substrate. At DTU Nanolab we have four different types of lithography available:
- UV Lithography: UV lithography is used for making features as small as about 1 micrometer
- DUV Stepper Lithography: DUV lithography is used for features as small as 200 nm
- E-beam Lithography: The smallest features can be made in our e-beam writers - about 10 nm
- Nano Imprint Lithography: for stamping without irradiation
Comparing lithography methods at DTU Nanolab
| UV Lithography | DUV Stepper Lithography | E-beam Lithography | Nano Imprint Lithography | |
|---|---|---|---|---|
| Generel description | Pattern transfer via ultraviolet (UV) light | Pattern transfer via deep ultraviolet (DUV) light | Patterning by electron beam | Pattern transfer via hot embossing (HE) |
| Pattern size range | ~1 µm and up (resist type, thickness, and pattern dependent) |
~200 nm and up (pattern type, shape and pitch dependent) |
~10-1000 nm (and larger at high currents) |
~20 nm and up |
| Resist type |
UV sensitive:
|
DUV sensitive:
|
E-beam sensitive:
|
Imprint polymers:
|
| Resist thickness range | ~0.5 µm to 200 µm | ~50 nm to 2 µm | ~30 nm to 1 µm | ~100 nm to 2 µm |
| Typical exposure time | Mask aligner: 10-180 s per wafer Maskless aligner: 5-60 minutes per wafer |
Process dependent:
Throughput is up to 60 wafers/hour |
Process dependent:
Process time [s]: |
Process dependent, including heating/cooling rates |
| Substrate size |
|
|
We have cassettes fitting:
Only one cassette can be loaded at a time |
|
| Allowed materials | Any standard cleanroom material | Any standard cleanroom material |
Any standard cleanroom material, except:
|
Any standard cleanroom material |
Equipment and Process Pages
|
Pre-lithography
|
Coating
|
Exposure
|
Development
|
Post-lithography
|
Lithography Tool Package Training
DTU Nanolab offers a Tool Package Training course for Lithography (TPT Lithography), which covers the basic theory of lithography as well as an introduction to some of the most used tools for lithographic processing.
You are required to pass this course in order to become eligible for tool training on the lithography equipment in the cleanroom facility of DTU Nanolab. The course includes theory on lithographic processes and common equipment operation and consists of lecture videos followed by a quiz for each video. Once completed successfully, you may continue to the online equipment training for the specific lithography equipment you want to use. After completing the online equipment training, you can then request hands-on training for the equipment in the cleanroom via training@nanolab.dtu.dk.
The course is available via DTU Learn. You sign up for the course by enrolling yourself in the course here
TPT lithography course contents
- Online lecture videos
- Online quiz for each lecture video
Learning objectives
- Coating
- Exposure
- Development
- Resist, substrates and pre-treatment
- Post-lithography steps
Course responsible
- Jens Hindborg Hemmingsen
- Thomas Aarøe Anhøj
If you have questions you can contact us via lithography@nanolab.dtu.dk
Knowledge and Information about Lithography