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'''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_PolySilicon) click here]'''
'''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_PolySilicon) click here]'''


 
[[Category: Equipment|Thin film LPCVD Poly]]
[[index.php?title=Category:Equipment|Thin film LPCVD Poly]]
[[Category: Furnaces|LPCVD Poly]]
[[index.php?title=Category:Furnaces|LPCVD Poly]]
[[Category: Thin Film Deposition|LPCVD Poly]]
[[index.php?title=Category:Thin Film Deposition|LPCVD Poly]]
 


==Deposition of Silicon using LPCVD==
==Deposition of Silicon using LPCVD==
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The A, B, C and E stack furnaces can be controlled either from a touch screen by each furnace or from a furnace computer. The user manual for the furnace computer can be found here:
The A, B, C and E stack furnaces can be controlled either from a touch screen by each furnace or from a furnace computer. The user manual for the furnace computer can be found here:


[[index.php?title=Media:Furnace computer manual.pdf|Manual for furnace computers for the A, B, C and E stack furnaces]]
[[Media:Furnace computer manual.pdf|Manual for furnace computers for the A, B, C and E stack furnaces]]


==Process information==
==Process information==


*[[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_4%22_polysilicon_furnace|Deposition of polysilicon using the 4" polysilicon furnace]]
*[[/Standard recipes, QC limits and results for the 4" polysilicon furnace|Deposition of polysilicon using the B4 4" polysilicon furnace]]
*[[/Boron doped poly-Si and a-Si |Boron doped poly-Si and a-Si by using 4" polysilicon furnace]]
*[[/Boron doped poly-Si and a-Si |Boron doped poly-Si and a-Si by using the B4 4" polysilicon furnace]]
 
*[[/Phosphorous doped poly-Si|Phosphorous doped poly-Si using the B4 4" polysilicon furnace]]


*[[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6%22_polysilicon_furnace|Deposition of polysilicon using the 6" polysilicon furnace]]
*[[/Boron doped poly-Si |Boron doped poly-Si using 6" polysilicon furnace]]


<!-- hide text
*[[/Standard recipes, QC limits and results for the 6" polysilicon furnace|Deposition of polysilicon using the E2 6" polysilicon furnace]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of polysilicon/Deposition of polysilicon using LPCVD|Deposition of polysilicon using LPCVD]]
*[[/Boron doped poly-Si |Boron doped poly-Si using the E2 6" polysilicon furnace]]
hide text -->


==Overview of the performance of the LPCVD polysilicon processes and some process related parameters==
==Overview of the performance of the LPCVD polysilicon processes and some process related parameters==
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