Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New: Difference between revisions
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AR-N 7520 New is a resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists. | AR-N 7520 New is a negative resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists. | ||
=Contrast curve= | =Contrast curve= | ||
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* Time: 60 s | * Time: 60 s | ||
* Baking temperature: 85C | * Baking temperature: 85C | ||
* Baking time: | * Baking time: 60 s | ||
* Exposure: 100 kV (JEOL 9500) | * Exposure: 100 kV (JEOL 9500) | ||
* Development: AR 300-46 for 90 seconds | * Development: AR 300-46 for 90 seconds | ||
* Stopper: | * Stopper: DI for 30 seconds + blow dry with nitrogen | ||
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AR-N 7520.17 contrast curve. | AR-N 7520.17 New contrast curve. | ||
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