Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New: Difference between revisions

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+AR-N 7520 New is a negative resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists.
 =Contrast curve=
+* Coater: LabSpin 2
+* Substrate: 2" Si
+* Acceleration: 1000 RPM/s
+* Speed: 4000 RPM
+* Time: 60 s
+* Baking temperature: 85C
+* Baking time: 60 s
+* Exposure: 100 kV (JEOL 9500)
+* Development: AR 300-46 for 90 seconds
+* Stopper: DI for 30 seconds + blow dry with nitrogen
+{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
+|-
+| [[image:ARN7520New contrast curve.png|800px]]
+|-
+| colspan="1" style="text-align: center;|
+AR-N 7520.17 New contrast curve.
+|}