Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New: Difference between revisions
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AR-N 7520 New is a negative resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists. | |||
=Contrast curve= | |||
* Coater: LabSpin 2 | |||
* Substrate: 2" Si | |||
* Acceleration: 1000 RPM/s | |||
* Speed: 4000 RPM | |||
* Time: 60 s | |||
* Baking temperature: 85C | |||
* Baking time: 60 s | |||
* Exposure: 100 kV (JEOL 9500) | |||
* Development: AR 300-46 for 90 seconds | |||
* Stopper: DI for 30 seconds + blow dry with nitrogen | |||
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| [[image:ARN7520New contrast curve.png|800px]] | |||
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AR-N 7520.17 New contrast curve. | |||
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Latest revision as of 11:49, 10 March 2025
AR-N 7520 New is a negative resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists.
Contrast curve
- Coater: LabSpin 2
- Substrate: 2" Si
- Acceleration: 1000 RPM/s
- Speed: 4000 RPM
- Time: 60 s
- Baking temperature: 85C
- Baking time: 60 s
- Exposure: 100 kV (JEOL 9500)
- Development: AR 300-46 for 90 seconds
- Stopper: DI for 30 seconds + blow dry with nitrogen
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|
AR-N 7520.17 New contrast curve. |