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{{cc-nanolab}}
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_and_sample_drying click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_and_sample_drying click here]'''  


'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''
 
 
=Drying Comparison Table=
=Drying Comparison Table=


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|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 2|Spin dryer 2]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 2|Spin dryer 2]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 3|Spin dryer 3]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 3|Spin dryer 3]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 4|Spin dryer 4]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 5|Spin dryer 5]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 5|Spin dryer 5]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 6|Spin dryer 6]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying/Critical Point Dryer|Critical point dryer]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying/Critical Point Dryer|Critical point dryer]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Ethanol fume dryer|Ethanol fume dryer]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Nitrogen guns|N<sub>2</sub> guns]]
|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Nitrogen guns|N<sub>2</sub> guns]]
|-
|-
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|
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*D-3
*D-3
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*C-1
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*In fumehoods and at chemical benches
*In fumehoods and at chemical benches
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*Drying
*Drying
*Rinsing + drying
*Rinsing + drying
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*Drying sensitive samples. E.g. with cantilevers
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*Drying sensitive samples. E.g. with cantilevers
*Drying sensitive samples. E.g. with cantilevers
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*1 to 5 wafers per run. Sizes: 2”, 4" or 6"
*1 to 5 wafers per run. Sizes: 2”, 4" or 6"
* Pieces (up to 10x10mm)
* Pieces (up to 10x10mm)
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*50 mm wafers: 1-25
*100 mm wafers: 1-25
*Pieces if a suitable carrier is available
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*One sample at a time
*One sample at a time
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*InAlP, GaAs
*InAlP, GaAs
*SU8
*SU8
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*No restriction except for polymers
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*No restriction
*No restriction
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'''The user manual, technical information, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=157 Spin dryer 2] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=158 Spin dryer 3]'''
'''The user manual, technical information, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=157 Spin dryer 2] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=158 Spin dryer 3]  [https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=408 Spin dryer 5] [https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=323 Spin dryer 6 (8")]'''




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== Spin dryer 4 ==
== Spin dryer 5 ==


[[File:spinDryer_4.jpg|640px|thumb|right]]
[[File:spinDryer_4.jpg|640px|thumb|right]]


Spin dryer 4 is located in D-3 between the HF vapor phase etcher and wet bench 07.
Spin dryer 5 is located in D-3 between the HF vapor phase etcher and wet bench 07.
*Top chamber: 100 mm wafers
*Top chamber: 100 mm wafers
*Bottom chamber: 150 mm wafers
*Bottom chamber: 150 mm wafers
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== Spin dryer 5 ==
== Spin dryer 6 ==


[[File:spinDryer_5.jpg|640px|thumb|right]]
[[File:spinDryer_5.jpg|640px|thumb|right]]


Spin dryer 5 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame.
Spin dryer 6 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame.
 
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= Ethanol fume dryer =
 
If your wafers are fragile or having thin membranes, cantilevers or suspended bridges that risk to stick or adhere to the surface it can be a good idea to dry your wafers in the ethanol fume dryer. Ethanol is heated to 70°C and your wafers are placed in the fumes of Ethanol which will make the water evaporate from the surface.
The Ethanol dryer is placed on a shelf or trolly in D-3 and looks like a US bath. Describtion on how to use is written on the bath.
 


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= Nitrogen guns =
= Nitrogen guns =
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