Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/RTP_Jipelec_2 click here]''' | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/RTP_Jipelec_2 click here]''' | ||
=RTP2 Jipelec - Rapid Thermal Processor= | =RTP2 Jipelec - Rapid Thermal Processor= | ||
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|style="background:WhiteSmoke; color:black;" align="left"|5/6 mbar, if minimum gas flow is used during process. | |style="background:WhiteSmoke; color:black;" align="left"|5/6 mbar, if minimum gas flow is used during process. | ||
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! | ! rowspan="7" |Process time | ||
| style="background:Silver; color:black" |At 1100 <sup>o</sup>C | |||
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|style="background:Silver; color:black"|At 1100 <sup>o</sup>C | |||
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*Max. 5 minutes | *Max. 5 minutes | ||
|style="background:WhiteSmoke; color:black;" align="left"| | | style="background:WhiteSmoke; color:black;" align="left" | | ||
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|style="background:Silver; color:black"|At 1000 <sup>o</sup>C | |style="background:Silver; color:black"|At 1000 <sup>o</sup>C | ||
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* '''Max. 100 <sup>o</sup>C/s''' with '''carrier wafer''' or '''sample wafer''' | * '''Max. 100 <sup>o</sup>C/s''' with '''carrier wafer''' or '''sample wafer''' | ||
* '''Max. | * '''Max. 20 <sup>o</sup>C/s''' with SiC-coated graphite '''susceptor''' | ||
|style="background:WhiteSmoke; color:black;" align="left"| At faster heating rates, the actual temperature might overshoot from the temperature setpoint in the recipe, and the susceptors/carriers might break. | |style="background:WhiteSmoke; color:black;" align="left"| At faster heating rates, the actual temperature might overshoot from the temperature setpoint in the recipe, and the susceptors/carriers might break. | ||
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