Specific Process Knowledge/Thin film deposition: Difference between revisions

MVD - Molecular Vapor Deposition
Electroplating of Ni, Cu, Au, etc. - Ask in the department of Mechanical Engineering
MOCVD - Epitaxial growth of InP, GaAs and other III-V materials - Ask DTU Electro if you are interested: Elizaveta Semenova or Kresten Yvind

@@ Line 1: / Line 1: @@
+{{cc-nanolab}}
 '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition click here]'''
-<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>
@@ Line 40: / Line 40: @@
 [[/Deposition of Titanium Nitride|Titanium Nitride]] - ''conductive ceramics'' <br/>
 [[/Deposition of Niobium Titanium Nitride| Niobium Titanium Nitride]] - ''superconductors''<br/>
+[[/Deposition of Niobium Nitride| Niobium Nitride (NbN)]] - ''superconductors''<br/>
 [[/Deposition of Aluminium Nitride| Aluminum Nitride (Al<sub>x</sub>N<sub>y</sub>)]]<br/>
 [[/Deposition of Scandium Nitride| Scandium Nitride (Sc<sub>x</sub>N<sub>y</sub>)]]<br/>
+[[/Deposition of Tungsten Nitride| Tungsten Nitride (W<sub>x</sub>N<sub>y</sub>)]]<br/>
+[[/Deposition of Tantalum Nitride| Tantalum Nitride (Ta<sub>x</sub>N<sub>y</sub>)]]<br/>
 |style="background: #DCDCDC"|
@@ Line 79: / Line 81: @@
 [[/Sputter deposition of metals and alloys|FeMn]]<br/>
 [[/Sputter deposition of metals and alloys|MnIr]]<br/>
-[[/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system#Process information|NbTi]] <br/>
+[[/Deposition of NbTi|NbTi]] <br/>
 [[/Deposition of NiFe|NiFe]]<br/>
 [[/Deposition of NiV|NiV]] alloy <br/>
 [[/Deposition of TiW|TiW]] alloy (10%/90% by weight) <br/>
+[[/Deposition of MoSi|MoSi]] alloy (50%/50% by At.%) <br/>
 And an electroceramic:
@@ Line 123: / Line 126: @@
 *[[/Cluster-based multi-chamber high vacuum sputtering deposition system|Sputter-system Metal-Oxide (PC1) and Sputter-system Metal-Nitride (PC3) ]] - ''Cluster-based multi-chamber high vacuum sputtering deposition system''
 *[[/Lesker|Lesker]] - ''Sputter tool''
-*[[/Wordentec|Wordentec]] - ''E-beam evaporator, sputter and thermal evaporator''
 *[[/thermalevaporator|Thermal evaporator]]
 *[[/Temescal|E-Beam Evaporator (Temescal)]]