Specific Process Knowledge/Lithography/EBeamLithography/ma-N 2400: Difference between revisions
Created page with "=Spin coating= ma-N 2400 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for ma-N 2400.05 is provided below. Process parameters are: *Date: May 31st 2024 *Coater: LabSpin 2 *Substrate: 2" Si *Acceleration: 1000 RPM/s *Time: 60 s *Baking temperature: 90C (setpoint at 100C) *Baking time: 60 s {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" |- | 800px |- | colspan="1" style="t..." |
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=Spin coating= | =Spin coating= | ||
ma-N 2400 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for ma-N 2400.05 is provided below. Process parameters are: | The resist ma-N 2400 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for ma-N 2400.05 is provided below. Process parameters are: | ||
*Date: May 31st 2024 | *Date: May 31st 2024 | ||
*Coater: LabSpin 2 | *Coater: LabSpin 2 | ||
Latest revision as of 11:52, 17 September 2026
Spin coating
The resist ma-N 2400 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for ma-N 2400.05 is provided below. Process parameters are:
- Date: May 31st 2024
- Coater: LabSpin 2
- Substrate: 2" Si
- Acceleration: 1000 RPM/s
- Time: 60 s
- Baking temperature: 90C (setpoint at 100C)
- Baking time: 60 s
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ma-N 2400.05 spin curve. |
Resulting resist thickness can be determined as y = axb+c, where y is thickness [nm], x is spin speed [RPM], a = 1015400, b = -1.1 and c = 368.3.