Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01 Info page in LabManager] | *[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01 Info page in LabManager] | ||
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02 Info page in LabManager] | *[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02 Info page in LabManager] | ||
*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach= | *[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=508 Fume Hood 12 (Standard clean) Info page in LabManager] | ||
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Cleaning of masks using the dedicated bath in Wet bench 03. | Cleaning of masks using the dedicated bath in Wet bench 03. | ||
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Cleaning of wafers using a beaker in a fumehood in cleanroom | Cleaning of wafers using a beaker in a fumehood in cleanroom D3. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the Wafer or Mask Cleaning bath. | ||
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