Specific Process Knowledge/Lithography/CSAR: Difference between revisions
No edit summary |
|||
| Line 1: | Line 1: | ||
Simple e-beam pattern in this resist has been tested, the results showed on this page. If you have questions to the process or wish to use this e-beam resist, please contact [mailto:lithography@nanolab.dtu.dk lithography] at DTU Nanolab. | Simple e-beam pattern in this resist has been tested, the results showed on this page. If you have questions to the process or wish to use this e-beam resist, please contact [mailto:lithography@nanolab.dtu.dk lithography] at DTU Nanolab. | ||
== Spin Curves == | == Spin Curves == | ||
| Line 190: | Line 186: | ||
|549 | |549 | ||
|- | |- | ||
|} | |} | ||
== Contrast Curve == | == Contrast Curve == | ||