Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
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Some steps are done using Beamer from GenISys GmbH. We advise all users to familiarise themselves with Beamer [https://www.genisys-gmbh.com/webinar-series-beamer-training.html through the tutorial series found on GenISys own website.] or from our own [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|Beamer guide.]] | Some steps are done using Beamer from GenISys GmbH. We advise all users to familiarise themselves with Beamer [https://www.genisys-gmbh.com/webinar-series-beamer-training.html through the tutorial series found on GenISys own website.] or from our own [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|Beamer guide.]] | ||
Please observe that wafers are clamped in such a way that it is not possible to expose the rim of the wafer. The patternable diameter for wafers are as listed below. Writing a pattern outside this area does not damage the tool but it is a waste of time. | |||
*2": 44 mm | |||
*4": 93 mm | |||
*6": 138 mm | |||
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*Use a nummerical PSF | *Use a nummerical PSF | ||
The pre-computed PSF can be loaded from either a separate file, from the local archive or from the global archive. In any case the file will probably originate from a Tracer simulation | The pre-computed PSF can be loaded from either a separate file, from the local archive or from the global archive. In any case the file will probably originate from a Tracer simulation. It can be advantageus to place your PSF in the global (network) archive such that it is available on the Beamer PC in the cleanroom as well as the Beamer PC outside the cleanroom. | ||
A guassian approximation is mostly useful if trying to replicate a result from litterature or if one has worked deliberately towards determining the gaussian constants for a particular process. | A guassian approximation is mostly useful if trying to replicate a result from litterature or if one has worked deliberately towards determining the gaussian constants for a particular process. | ||