Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride: Difference between revisions
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<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i> | <i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i> | ||
== Deposition of | == Deposition of Scandium Nitride == | ||
Deposition of ScN can only be done by reactive sputtering using Sc target. | Deposition of ScN can only be done by reactive sputtering using Sc target. | ||
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The only tool for this application is the Cluster-based multi-chamber high vacuum sputtering deposition system, commonly referred to as the 'Cluster Lesker.' The operating process is thoroughly documented and described in detail.: | The only tool for this application is the Cluster-based multi-chamber high vacuum sputtering deposition system, commonly referred to as the 'Cluster Lesker.' The operating process is thoroughly documented and described in detail.: | ||
* [[Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride/ScN Reactive | * [[Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride/ScN Reactive Sputtering in Cluster Lesker PC3|Deposition of Scandium Nitride (ScN) using reactive sputtering]] in Sputter-System Metal-Nitride(PC3) Source 1 (4-inch target) | ||
At the moment (October 2023) we have a 4-inch Sc target (0.250" thick bonded to Cu) for PC3 Src1. | At the moment (October 2023) we have a 4-inch Sc target (0.250" thick, bonded to Cu) for PC3 Src1. | ||
Latest revision as of 12:56, 9 November 2023
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Unless otherwise stated, this page is written by DTU Nanolab internal
Deposition of Scandium Nitride
Deposition of ScN can only be done by reactive sputtering using Sc target.
The only tool for this application is the Cluster-based multi-chamber high vacuum sputtering deposition system, commonly referred to as the 'Cluster Lesker.' The operating process is thoroughly documented and described in detail.:
- Deposition of Scandium Nitride (ScN) using reactive sputtering in Sputter-System Metal-Nitride(PC3) Source 1 (4-inch target)
At the moment (October 2023) we have a 4-inch Sc target (0.250" thick, bonded to Cu) for PC3 Src1.