LabAdviser/314/Preparation 314-307/Solid-matter: Difference between revisions
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[[Category:314]] | [[Category:314]] | ||
[[Category:314-Preparation]] | [[Category:314-Preparation]] | ||
Mechanical preparation equipment is available for experience users, who know how to use the equipment. Access to the preparation lab is needed. We do not provide training on the equipment. | |||
= Cutting = | = Cutting = | ||
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== Dimple Grinder == | == Dimple Grinder == | ||
[ | [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=15&name=Manual+-+DIMPLING+GRINDER+MODEL+200.pdf Manual] ''- requires login'' | ||
[[File:Dimple_Grinder.jpg|200px|left|thumb|Location Building 307, Prep Lab 109]].<br /> | [[File:Dimple_Grinder.jpg|200px|left|thumb|Location Building 307, Prep Lab 109]].<br /> | ||
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= Ion Milling = | = Ion Milling = | ||
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== Fischione Low Angle Ion Milling and Polishing System Model 1010 == | == Fischione Low Angle Ion Milling and Polishing System Model 1010 == | ||
The Fischione Ion Mill is used for producing TEM specimens with large electron transparent areas. Samples are pre-thinned by e.g. mechanical grinding and polishing or chemical polishing. The milling or polishing is performed by argon ions. The instrument has two independently adjustable Hollow Anode Discharge (HAD) argon ion sources, which can be operated from 0.5 to 6.0 kV with currents from 3 mA to 8 mA. The milling angle can be adjusted in the range of 0° to 45°. Tuning the milling parameters allows for coarse or gentle milling and the goal is to get clean samples free of physical or chemical artifacts | The Fischione Ion Mill is used for producing TEM specimens with large electron transparent areas. Samples are pre-thinned by e.g. mechanical grinding and polishing or chemical polishing. The milling or polishing is performed by argon ions. The instrument has two independently adjustable Hollow Anode Discharge (HAD) argon ion sources, which can be operated from 0.5 to 6.0 kV with currents from 3 mA to 8 mA. The milling angle can be adjusted in the range of 0° to 45°. Tuning the milling parameters allows for coarse or gentle milling and the goal is to get clean samples free of physical or chemical artifacts | ||
[ | [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=15&name=Operation_Manual_Fischione_1010.pdf Manual] ''- requires login'' | ||
[[File:IMG_3674.JPG|300px|left|thumb|Location Building 307, Prep Lab 109]].<br /> | [[File:IMG_3674.JPG|300px|left|thumb|Location Building 307, Prep Lab 109]].<br /> | ||
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== Fischione NanoMill model 1040 == | == Fischione NanoMill model 1040 == | ||