Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation E1 furnace: Difference between revisions
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An acceptance test was done after the installation in November 2021 by Tempress. For wet oxidation at 1050 C and 30 minutes, the thickness variation over a wafer was 1.3%(wafer in wafer), over the boat was 0.35%(wafer to wafer) and ran to ran was 0.64%. | |||
[[File:Wet1050_Acceptance_test.PNG| | [[File:Wet1050_Acceptance_test.PNG|1100x1100px|center|thumb|Acceptance test by Tempress from November 2021.]] | ||
Latest revision as of 13:02, 15 June 2023
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Unless otherwise stated, this page is written by DTU Nanolab internal
An acceptance test was done after the installation in November 2021 by Tempress. For wet oxidation at 1050 C and 30 minutes, the thickness variation over a wafer was 1.3%(wafer in wafer), over the boat was 0.35%(wafer to wafer) and ran to ran was 0.64%.
