Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation E1 furnace: Difference between revisions
No edit summary |
No edit summary |
||
| (4 intermediate revisions by the same user not shown) | |||
| Line 1: | Line 1: | ||
= | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Wet_oxidation_E1 click here]''' | ||
<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i> | <i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i> | ||
An acceptance test was done after the installation in November 2021 by Tempress. For wet oxidation at 1050 C and 30 minutes, the thickness variation over a wafer was 1.3%(wafer in wafer), over the boat was 0.35%(wafer to wafer) and ran to ran was 0.64%. | |||
[[File:Wet1050_Acceptance_test.PNG| | [[File:Wet1050_Acceptance_test.PNG|1100x1100px|center|thumb|Acceptance test by Tempress from November 2021.]] | ||
Latest revision as of 13:02, 15 June 2023
Feedback to this page: click here
Unless otherwise stated, this page is written by DTU Nanolab internal
An acceptance test was done after the installation in November 2021 by Tempress. For wet oxidation at 1050 C and 30 minutes, the thickness variation over a wafer was 1.3%(wafer in wafer), over the boat was 0.35%(wafer to wafer) and ran to ran was 0.64%.
