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=Dry Oxidation in the C1 furnace=
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]
 
<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>
 
The C1 furnace can be used for dry oxidation of 4" and 6" wafers.  
The C1 furnace can be used for dry oxidation of 4" and 6" wafers.  


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===Dry Oxidation uniformity for 4" wafers===
==Dry Oxidation uniformity for 4" wafers==


A dry oxidation has been done with 30 4" wafers in the quartz boat in the furnace to get an idea of how uniform the oxide layer is from wafer to wafer over the boat.  
A dry oxidation has been done with 30 4" wafers in the quartz boat in the furnace to get an idea of how uniform the oxide layer is from wafer to wafer over the boat.  
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''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech).''
''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech), 2018.''




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