Specific Process Knowledge/Characterization/XPS/XPS Depth profiling: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| (3 intermediate revisions by the same user not shown) | |||
| Line 3: | Line 3: | ||
<!-- Page reviewed 8/5-2023 jmli --> | <!-- Page reviewed 8/5-2023 jmli --> | ||
{{Author-jmli1}} | {{Author-jmli1}} | ||
<!--Checked for updates on 4/9-2025 - ok/jmli --> | |||
=Depth profiling= | =Depth profiling= | ||
| Line 18: | Line 19: | ||
* Polysilicon | * Polysilicon | ||
[[File:profile sandwich 3.PNG|700px]] | [[File:profile sandwich 3.PNG|700px|{{photo1}}]] | ||
In the spectra required to make such a depth profile, one can distinguish the various chemical environments of silicon depending on whether it is bonded to: | In the spectra required to make such a depth profile, one can distinguish the various chemical environments of silicon depending on whether it is bonded to: | ||