Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4: Difference between revisions
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'''''All images on this page has been created by Peixiong Shi, DTU | '''''All images on this page has been created by Peixiong Shi, DTU Nanolab''''' <br> | ||
==Images stepper_6A1_feb262013_step9== | ==Images stepper_6A1_feb262013_step9== | ||
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4"> | <gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4"> |
Latest revision as of 15:21, 22 March 2023
All images on this page has been created by Peixiong Shi, DTU Nanolab
Images stepper_6A1_feb262013_step9
Images stepper_6A4_feb262013_step9
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wafer edge
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wafer edge
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wafer edge
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wafer edge
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Position of the scanning: wafer edge
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wafer edge
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wafer edge
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wafer center
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wafer center
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wafer center
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wafer center
Images Stepper_6A5_feb272013
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Wafer edge
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Wafer edge
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Wafer edge
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Wafer edge
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Wafer edge
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Wafer edge
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Wafer center
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Wafer center
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Wafer center
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Wafer center
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Wafer center
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Top view
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Top view
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Top view
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Top view
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Top view
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Top view