Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4: Difference between revisions

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'''''All images on this page has been created by Peixiong Shi, DTU Nanloab''''' <br>
'''''All images on this page has been created by Peixiong Shi, DTU Nanolab''''' <br>
==Images stepper_6A1_feb262013_step9==
==Images stepper_6A1_feb262013_step9==
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4">
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4">

Latest revision as of 15:21, 22 March 2023

All images on this page has been created by Peixiong Shi, DTU Nanolab

Images stepper_6A1_feb262013_step9

  • 6A1_feb262013_step9

Images stepper_6A4_feb262013_step9

  • 6A4_feb262013_step9
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • Position of the scanning: wafer edge
    Position of the scanning: wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer center
    wafer center
  • wafer center
    wafer center
  • wafer center
    wafer center
  • wafer center
    wafer center

Images Stepper_6A5_feb272013

  • 6A5_feb262013 step9 and step10
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view

images 3

  • 6A1_feb262013_step9
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