Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4: Difference between revisions
No edit summary |
No edit summary |
||
| (One intermediate revision by the same user not shown) | |||
| Line 1: | Line 1: | ||
'''''All images on this page has been created by Peixiong Shi, DTU Nanolab''''' <br> | |||
==Images stepper_6A1_feb262013_step9== | ==Images stepper_6A1_feb262013_step9== | ||
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4"> | <gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4"> | ||
image:8mm from wafer edge_074.jpg | image:8mm from wafer edge_074.jpg | ||
Latest revision as of 15:21, 22 March 2023
All images on this page has been created by Peixiong Shi, DTU Nanolab
Images stepper_6A1_feb262013_step9
- 6A1_feb262013_step9
-
-
-
-
Images stepper_6A4_feb262013_step9
- 6A4_feb262013_step9
-
wafer edge -
wafer edge -
wafer edge -
wafer edge -
Position of the scanning: wafer edge -
wafer edge -
wafer edge -
-
-
wafer center -
wafer center -
wafer center -
wafer center
Images Stepper_6A5_feb272013
- 6A5_feb262013 step9 and step10
-
Wafer edge -
Wafer edge -
Wafer edge -
Wafer edge -
Wafer edge -
Wafer edge -
Wafer center -
Wafer center -
Wafer center -
Wafer center -
Wafer center -
Top view -
Top view -
Top view -
Top view -
Top view -
Top view
images 3
- 6A1_feb262013_step9