Specific Process Knowledge/Etch/Wet Polysilicon Etch: Difference between revisions
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'''All measurements on this page has been made by Nanolab staff.''' | '''All measurements on this page has been made by Nanolab staff.''' | ||
[[Category: Equipment|Etch Wet Polysilicon]] | [[index.php?title=Category:Equipment|Etch Wet Polysilicon]] | ||
[[Category: Etch (Wet) bath|Polysilicon]] | [[index.php?title=Category:Etch (Wet) bath|Polysilicon]] | ||
==Wet PolySi Etch== | ==Wet PolySi Etch== | ||
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HNO<sub>3</sub> : BHF : H<sub>2</sub>O - (20 : 1 : 20) | HNO<sub>3</sub> : BHF : H<sub>2</sub>O - (20 : 1 : 20) | ||
'''NB: The life time of the solution is a few days to 4 weeks.''' | '''NB: The life time of the solution is a few days to 4 weeks. There are dummy wafers placed in the drawer which can be used for testing the etchrate.''' | ||
'''The user manual and contact information can be found in LabManager:''' | '''The user manual and contact information can be found in LabManager:''' | ||