Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Au etch: Difference between revisions
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!style="background:silver; color:black" align="left" valign="top"|Etch rate uniformity | !style="background:silver; color:black" align="left" valign="top"|Etch rate uniformity | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*< | *<±2% | ||
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* | *±(0.2% +-0.2%) | ||
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!style="background:silver; color:black" align="left" valign="top"|Reproducibility | !style="background:silver; color:black" align="left" valign="top"|Reproducibility | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*< | *<±2% | ||
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* | *±0.9% | ||
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!style="background:silver; color:black" align="left" valign="top"|Selectivity (Au etch rate/ZEP etch rate) | !style="background:silver; color:black" align="left" valign="top"|Selectivity (Au etch rate/ZEP etch rate) | ||