Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Au etch: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/IBE_Au_etch click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/IBE_Au_etch click here]''' | ||
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!style="background:silver; color:black" align="left" valign="top"|Etch rate uniformity | !style="background:silver; color:black" align="left" valign="top"|Etch rate uniformity | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*< | *<±2% | ||
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* | *±(0.2% +-0.2%) | ||
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!style="background:silver; color:black" align="left" valign="top"|Reproducibility | !style="background:silver; color:black" align="left" valign="top"|Reproducibility | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*< | *<±2% | ||
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* | *±0.9% | ||
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!style="background:silver; color:black" align="left" valign="top"|Selectivity (Au etch rate/ZEP etch rate) | !style="background:silver; color:black" align="left" valign="top"|Selectivity (Au etch rate/ZEP etch rate) | ||
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{| border="1" cellspacing="1" cellpadding="2" | {| border="1" cellspacing="1" cellpadding="2" | ||
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[[image:IBE | [[image:IBE accpetance S18-AU-ZEP3.jpg|450x450px|thumb|center|s18-Au-ZEP3]] | ||
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[[image:IBE | [[image:IBE acceptance S18-AU-ZEP5.jpg|450x450px|thumb|center|s18-Au-ZEP5]] | ||
|} | |} | ||