Specific Process Knowledge/Characterization/SEM LEO: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_LEO0 click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_LEO0 click here]''' | ||
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'''<p style="color:red;">The SEM LEO has been decomissioned and relocated to DTU Mechanics in 2020.</p>''' | |||
=SEM LEO= | |||
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[[image:IMG_3290.jpg|400x400px|right|thumb|The SEM LEO located in cleanroom F-2]] | [[image:IMG_3290.jpg|400x400px|right|thumb|The SEM LEO located in cleanroom F-2]] | ||
The SEM LEO was a very reliable and rugged instrument that provided high quality SEM images of most samples and it served the users of the cleanroom for many years. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers were acquired by the thousands on the SEM. | The SEM LEO was a very reliable and rugged instrument that provided high quality SEM images of most samples and it served the users of the cleanroom for many years. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers were acquired by the thousands on the SEM. | ||
In her later years the SEM LEO was equipped with a Raith e-beam lithography system and was exclusively dedicated to the users of the Raith E-beam lithography. | In her later years the SEM LEO was equipped with a Raith e-beam lithography system and was exclusively dedicated to the users of the Raith E-beam lithography. | ||
===Typical current values for EBL=== | ===Typical current values for EBL=== | ||